IP Library Granted Patent US 8,105,752
Granted Patent B2
US 8,105,752 · App. 12/534,173 · Granted Jan 31, 2012

Photosensitive polyimides

Assignee: Eternal Chemical Co., Ltd.
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Quick Facts
Patent No.
US 8,105,752
App. No.
12/534,173
Granted
Jan 31, 2012
Kind
B2
Abstract

The invention pertains to an epoxy-modified photosensitive polyimide, which possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used in a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed circuit board.

Claims (38)

1. A photosensitive polyimide of formula (I):

wherein:

A represents a tetravalent organic group with at least one modifying group R 1 ;

B and D are the same or different and each represent a divalent organic group;

C represents a tetravalent organic group without any modifying group R 1 ;

m represents an integer of more than 0; and

n represents 0 or an integer more than 0,

wherein the modifying group R 1 is selected from the group consisting of:

wherein R 2 represents a vinyl-group containing unsaturated radical.

2. The photosensitive polyimide of claim 1 , wherein the vinyl-group containing unsaturated radical is selected from the group consisting of:

wherein:

R 3 represents H or methyl, and o and p each represent an integer of 0 to 6.

3. The photosensitive polyimide of claim 1 , wherein A is selected from the group consisting of:

wherein:

R 1 is as defined in claim 1 ;

R 4 is —CH 2 —, —O—, —S—, —CO—, —SO 2 —, C(CH 3 ) 2 , or C(CF 3 )—;

R 5 is —H or —CH 3 ; and

X is —O—, —NH—, or —S—.

4. The photosensitive polyimide of claim 3 , wherein A is selected from the group consisting of:

wherein R 1 is as defined in claim 1 .

5. The photosensitive polyimide of claim 1 , wherein C is selected from the group consisting of:

6. The photosensitive polyimide of claim 5 , wherein C is selected from the group consisting of:

7. The photosensitive polyimide of claim 1 , wherein B and D each represent a divalent organic group selected from the group consisting of:

wherein:

R 7 is H, methyl, or ethyl;

R 8 is H, C 1 -C 4 alkyl, C 1 -C 4 perfluoroalkyl, methoxy, ethoxy, halogen, OH, COOH, NH 2 or SH;

a is integer of more than 0;

b is integer of more than 0;

c is an integer of 0 to 4;

d is an integer of 0 to 4; and

R 9 is a covalent bond or a radical selected from:

wherein w and x each represent an integer of more than 0,

and R 11 is —S(O) 2 —, —C(O)—, a covalent bond, or a substituted or unsubstituted C 1 to C 18 organic group.

8. The photosensitive polyimide of claim 7 , wherein B and D each represent a divalent organic group selected from the group consisting of:

wherein y represents an integer of 1 to 12.

9. A photosensitive composition comprising the photosensitive polyimide as claimed in claim 1 and a photoinitiator.

10. The photosensitive composition of claim 9 , further comprising a reactive monomer or oligomer.

11. The photosensitive composition of claim 9 for use in a liquid photo resist or dry film resist.

Assignments (3)
CHANGE OF NAME Recorded Feb 3, 2015
From: ETERNAL CHEMICAL CO., LTD.
To: ETERNAL MATERIALS CO., LTD.
Reel/Frame 034884/0786 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2013
From: RTI TECHNOLOGIES INC.
To: MAHLE CLEVITE INC.
Reel/Frame 030119/0610 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 3, 2009
From: CHOU, MENG-YEN; LEE, CHUAN ZONG
To: ETERNAL CHEMICAL CO., LTD.
Reel/Frame 023040/0404 →
Priority Claims (1)
TW 97138792 A · Oct 8, 2008 · national
Continuity (1)
Related Publication 20100086871A1 · Apr 8, 2010