IP Library Granted Patent US 8,124,176
Granted Patent B2
US 8,124,176 · App. 11/804,472 · Granted Feb 28, 2012

Polymer-assisted deposition of films

Assignee: Los Alamos National Security, LLC
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Quick Facts
Patent No.
US 8,124,176
App. No.
11/804,472
Granted
Feb 28, 2012
Kind
B2
Abstract

A polymer assisted deposition process for deposition of metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be conformal on a variety of substrates including non-planar substrates. In some instances, the films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

Claims (10)

1. A process of preparing a uniform metal nitride film comprising:

preparing a homogeneous solution of metal-bound polymer by combining a soluble metal precursor and a soluble polymer selected from the group consisting of polyethyleneimine, derivatives of polyethyleneimine, polyacrylic acid, and poly(ethylene-maleic acid) in a suitable solvent,

applying the homogeneous solution onto a substrate to form a polymer and metal containing layer thereon,

heating said substrate in a reducing atmosphere at temperatures and for time characterized as sufficient to remove said polymer from said polymer and metal containing layer and form a uniform metal nitride film.

2. The process of claim 1 wherein said heating said substrate includes first heating said substrate in a hydrogen-containing atmosphere at temperatures and for time characterized as sufficient to remove said polymer from said polymer and metal containing layer and second further heating said substrate in an ammonia atmosphere at temperatures and for time characterized as sufficient to form a conformal metal nitride film.

3. The process of claim 2 wherein said reducing atmosphere is a mixture of hydrogen and nitrogen.

4. The process of claim 3 wherein said reducing atmosphere is a mixture of about 6 percent hydrogen and about 94 percent nitrogen by volume.

5. The process of claim 1 wherein said metal is titanium, aluminum or gallium.

6. The process of claim 1 wherein said metal is a titanium and aluminum mixture.

7. The process of claim 1 wherein said metal is molybdenum, niobium, titanium, aluminum or gallium.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 7, 2018
From: LOS ALAMOS NATIONAL SECURITY, LLC
To: TRIAD NATIONAL SECURITY, LLC
Reel/Frame 047446/0849 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2009
From: REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE
To: LOS ALAMOS NATIONAL SECURITY, LLC
Reel/Frame 022591/0552 →
CONFIRMATORY LICENSE Recorded May 16, 2008
From: LOS ALAMOS NATIONAL SECURITY
To: ENERGY, U.S. DEPARTMENT OF
Reel/Frame 020964/0109 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 9, 2007
From: MCCLESKEY, THOMAS M.; BURRELL, ANTHONY K.; JIA, QUANXI; LIN, YUAN
To: REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE
Reel/Frame 020147/0676 →
Continuity (4)
Continuation In Part 10888868 · Jul 8, 2004
Continuation In Part 10616479 · Jul 8, 2003
Continuation In Part 09629116 · Jul 31, 2000
Related Publication 20080050528A1 · Feb 28, 2008