IP Library Granted Patent US 8,148,922
Granted Patent B2
US 8,148,922 · App. 12/539,347 · Granted Apr 3, 2012

High-current DC proton accelerator

Assignee: Ion Beam Applications SA
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Quick Facts
Patent No.
US 8,148,922
App. No.
12/539,347
Granted
Apr 3, 2012
Kind
B2
Abstract

A dc accelerator system able to accelerate high currents of proton beams at high energies is provided. The accelerator system includes a dc high-voltage, high-current power supply, an evacuated ion accelerating tube, a proton ion source, a dipole analyzing magnet and a vacuum pump located in the high-voltage terminal. The high-current, high-energy dc proton beam can be directed to a number of targets depending on the applications such as boron neutron capture therapy BNCT applications, NRA applications, and silicon cleaving.

Claims (15)

1. An accelerator system able to accelerate high currents (5 mA or more) of proton beams at high energies (0.3 MeV or more) comprising:

a dc accelerating structure having an accelerating column, wherein the accelerating column comprises a plurality of conducting electrodes separated from each other by insulating rings, the accelerating column configured to provide an accelerating electric field to accelerate the proton beam;

a high voltage (0.3 MeV or more), high current (5 mA or more) power supply providing accelerating voltage to said accelerating structure;

a proton ion source having a beam extraction aperture, wherein the proton ion source provides 5 mA or more of proton beam while releasing less than 3 SCCM of neutral hydrogen gas through the beam extraction hole;

a dipole analyzing magnet located between the ion source and the accelerating column, wherein the field configuration of the analyzing magnet prevents ions other than protons produced by the ion source to reach the accelerating structure.

2. An accelerating system as in claim 1 , further comprising a vacuum pump connected to the vacuum chamber connecting the ion source and the accelerating structure.

3. An accelerating system as in claim 1 , where the high voltage power supply is a Dynamitron structure.

4. An accelerating system as in claim 1 , where the ion source utilizes microwaves to ionize the gas.

5. An accelerating system as in claim 4 where the ion source uses Electron Cyclotron Resonance to ionize the gas.

6. An accelerating system as in claim 1 , where the dipole analyzing magnet of claim 1 is comprised is a fixed field analyzing magnet.

7. An accelerating system as in claim 6 , where the fixed field analyzing magnet is designed to be doubly focusing.

8. An accelerating system as in claim 1 , further comprising pieces of permanent magnet material placed around the accelerating column positioned to prevent secondary electrons to be accelerated backward in the accelerating column.

9. An accelerating system as in claim 1 , where an aperture having a diameter smaller than the diameter of the electrodes of the accelerating column is placed at the entrance of the accelerating structure.

10. An accelerating system as in claim 2 further comprising an aperture having a diameter smaller than the diameter of the electrodes of the accelerating column and placed at the entrance of the accelerating structure.

11. An accelerating system as in claim 1 , where the accelerated beam is spread on a receiving surface of at least 1 square meter by a pair of orthogonal scanning magnets scanning the beam on the receiving surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2011
From: CLELAND, PH.D., MARSHALL R.; GALLOWAY, RICHARD A.; DESANTO, LEONARD; JONGEN, YVES
To: ION BEAM APPLICATIONS S.A.
Reel/Frame 025984/0629 →
Continuity (2)
Provisional Application 61087853 · Aug 11, 2008
Related Publication 20100033115A1 · Feb 11, 2010