Inductively-coupled plasma device
A plasma device configured to receive ionizable media is disclosed. The plasma device includes a first pair of dielectric substrates each having an inner surface and an outer surface. The first pair of dielectric substrates is disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another. The device also includes a first pair of spiral coils each disposed on the inner surface of the dielectric substrates. The first pair of spiral coils is configured to couple to a power source and configured to inductively couple to an ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
1. A plasma device configured to receive ionizable media, comprising:
a first pair of dielectric substrates each having an inner surface and an outer surface, the first pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another; and
a first pair of spiral coils each disposed on the inner surface of the dielectric substrates, wherein the first pair of spiral coils is configured to couple to a power source and configured to inductively couple to an ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
2. The plasma device according to claim 1 , further comprising:
a plurality of offsets disposed between the first pair of dielectric substrates.
3. The plasma device according to claim 1 , wherein each of the spiral coils of the first pair of spiral coils is formed from a wire to form a disk-like structure.
4. The plasma device according to claim 1 , wherein each of the spiral coils of the first pair of spiral coils formed from a wire to form a ring-like structure.
5. The plasma device according to claim 1 , wherein each of the dielectric substrates of the first pair of dielectric substrates is formed from a thermosetting dielectric polymer.
6. The plasma device according to claim 1 , wherein each of the spiral coils of the first pair of spiral coils is traced on the corresponding dielectric substrate.
7. The plasma device according to claim 1 , further comprising:
a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates includes an inner surface and an outer surface, the second pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another; and
a second pair of spiral coils each disposed on the inner surface of the second dielectric substrates, wherein the second pair of spiral coils is configured to couple to the power source and configured to inductively couple to the ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
8. A plasma device configured to receive ionizable media, comprising:
a first pair of dielectric substrates each having an inner surface and an outer surface, the first pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another;
a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates includes an inner surface and an outer surface, the second pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another;
a first pair of spiral coils each disposed on the inner surface of the dielectric substrates; and
a second pair of spiral coils each disposed on the inner surface of the second dielectric substrates, wherein the first and second pairs of spiral coils are configured to couple to the power source and configured to inductively couple to the ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
9. The plasma device according to claim 8 , further comprising:
a plurality of offsets disposed between the first pair of dielectric substrates.
10. The plasma device according to claim 8 , wherein each of spiral coils of the first and second pairs of spiral coils is formed from a wire to form a disk-like structure.
11. The plasma device according to claim 8 , wherein each of the spiral coils of the first and second pairs of spiral coils is formed from a wire to form a ring-like structure.
12. The plasma device according to claim 8 , wherein each of the dielectric substrates of the first and second pairs of dielectric substrates is formed from a thermosetting dielectric polymer.
13. The plasma device according to claim 8 , wherein each of the spiral coils of the first and second pairs of spiral coils is traced on the corresponding dielectric substrate.
14. A plasma system, comprising:
a plasma device including:
a first pair of dielectric substrates each having an inner surface and an outer surface, the first pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another;
a first pair of spiral coils each disposed on the inner surface of the dielectric substrates;
an ionizable media source coupled to the plasma device and configured to supply ionizable media between the first pair of dielectric substrates; and
a power source coupled to the first pair of spiral coils, wherein the first pair of spiral coils is configured to inductively couple to the ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.
15. The plasma system according to claim 14 , further comprising:
a plurality of offsets disposed between the first pair of dielectric substrates.
16. The plasma system according to claim 14 , wherein each of the spiral coils of the first pair of spiral coils is formed from a wire to form a disk-like structure.
17. The plasma system according to claim 14 , wherein each of the spiral coils of the first pair of spiral coils is formed from a wire to form a ring-like structure.
18. The plasma system according to claim 14 , wherein each of the dielectric substrates of the first pair of dielectric substrates is formed from a thermosetting dielectric polymer.
19. The plasma system according to claim 14 , wherein each of the spiral coils of the first pair of spiral coils is traced on the corresponding dielectric substrate.
20. The plasma system according to claim 14 , wherein the plasma device further includes:
a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates includes an inner surface and an outer surface, the second pair of dielectric substrates disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another; and
a second pair of spiral coils each disposed on the inner surface of the second dielectric substrates, wherein the power source is coupled to the second pair of spiral coils that are configured to inductively couple to the ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.