Method for forming dye sublimation images in solid substrates

1. A method for forming a dye sublimation image in a plastic substrate with a sheet having an image formed thereon of a sublimatic dyestuff and with a treatment that deposits a silicon compound on the sheet, the method comprising:

placing the image on the sheet with the treatment against a first surface of the substrate;

heating the sheet to a sublimation temperature, which causes the image of the sheet to sublimate into the substrate, wherein the image is sublimated into the first surface of the substrate;

cooling the sheet to a release temperature; and

removing the sheet from the substrate, wherein the plastic substrate is a thermoplastic substrate.

2. The method, as recited in claim 1 , wherein the sheet with the surface treatment that deposits the silicon compound provides a dry weight of silicon compound to paper of greater than 0.05%.

3. The method, as recited in claim 1 , further comprising placing an image on the sheet with the treatment, which is a treated sheet.

4. The method, as recited in claim 3 , wherein the placing the image on the treated sheet comprises passing the treated sheet through a printer, which prints the image on the treated sheet.

5. The method, as recited in claim 3 , further comprising:

selecting an image on a computer; and

sending a command from the computer to a printer, wherein the placing the image on the treated sheet comprises passing the treated sheet through the printer, which prints the image on the treated sheet.

6. The method, as recited in claim 5 , wherein the printer is an ink jet printer.

7. The method, as recited in claim 6 , wherein the treated sheet is a sheet of paper with the treatment that deposits the silicon compound.

8. The method, as recited in claim 7 , further comprising treating a sheet to obtain the sheet with a treatment, comprising:

forming a coating of the silicon compound on surfaces of the sheet;

drying the coating, wherein the dried coating of the silicon compound on the sheet has a weight of a silicon compound to paper of between 0.05% to 5.0%.

9. The method, as recited in claim 8 , wherein the sheet has an additional treatment in addition to the treatment that deposits the silicon compound.

10. The method, as recited in claim 9 , wherein the additional treatment provides a carboxymethyl cellulose additive to the paper.

11. The method, as recited in claim 1 , wherein the sheet with a treatment is a sheet of paper with the treatment that deposits the silicon compound.

12. A method for forming a dye sublimation image in a plastic substrate comprising:

treating a sheet of paper with a treatment that deposits a silicon compound;

placing an image on the treated sheet of paper;

placing the image on the treated sheet against a first surface of the substrate, wherein the plastic substrate is a thermoplastic substrate;

heating the treated sheet to a sublimation temperature, which causes the image of the treated sheet to sublimate into the substrate;

cooling the treated sheet to a release temperature; and

removing the treated sheet from the substrate.

13. The method, as recited in claim 12 , wherein the treating the sheet of paper with the treatment that deposits the silicon compound provides a dry weight of silicon compound to paper of greater than 0.05%.

14. The method, as recited in claim 13 , further comprising:

selecting an image on a computer; and

sending a command from the computer to a printer, wherein the placing the image on the sheet comprises passing the treated sheet through the printer, which prints the image on the treated sheet.

15. The method, as recited in claim 14 , wherein the printer is an ink jet printer.

16. A method for forming a dye sublimation image in a thermoplastic substrate comprising:

treating a sheet of paper with a treatment that deposits a silicon compound, wherein the treating the sheet of paper, comprises:

forming a coating of a silicon compound on surfaces of the sheet of paper; and

drying the coating of silicon compound, wherein a weight of the coating of silicon compound is between 0.05% to 5.0% of a weight of the sheet of paper;

placing an image on the treated sheet of paper;

placing the image on the treated sheet against a first surface of the substrate;

heating the treated sheet to a sublimation temperature, which causes the image of the treated sheet to sublimate into the substrate;

cooling the treated sheet to a release temperature; and

removing the treated sheet from the substrate.