IP Library Granted Patent US 8,309,879
Granted Patent B2
US 8,309,879 · App. 12/532,187 · Granted Nov 13, 2012

Processing apparatus using ultrashort pulse laser

Assignee: Korea Institute of Machinery & Materials
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Quick Facts
Patent No.
US 8,309,879
App. No.
12/532,187
Granted
Nov 13, 2012
Kind
B2
Abstract

The present invention relates to an ultrashort pulse laser processing device. The ultrashort pulse laser includes a stage a transfer member, a front confocal microscope, a front laser generating unit, and a front highpowered lens. A sample is provided on the stage to be processed, the transfer member transfers the stage, and the front confocal microscope is provided above the stage. The front laser generating unit is provided between the front confocal microscope and the stage to generate an ultrashort pulse laser, and the front high-powered lens focuses the laser provided from the front laser generating unit.

Claims (12)

1. An ultrashort pulse laser processing device comprising:

a stage on which a sample is provided to be processed;

a transfer member for transferring the stage;

a front confocal microscope provided above the stage;

a front laser generating unit provided between the front confocal microscope and the stage to generate an ultrashort pulse laser;

a front high-powered lens for focusing the laser provided from the front laser generating unit; and

a cantilevered nanoprobe microscope provided between the high-powered lens and the stage.

2. The ultrashort pulse laser processing device of claim 1 , wherein a hole is formed on the stage and the sample is provided on the hole.

3. The ultrashort pulse laser processing device of claim 1 , wherein a rear confocal microscope is provided under the stage.

4. The ultrashort pulse laser processing device of claim 3 , wherein a rear laser generating unit is provided between the stage and the rear confocal microscope to provide a laser to a rear surface of the stage.

5. The ultrashort pulse laser processing device of claim 1 , wherein the ultrashort pulse laser is a femto-second laser or a pico-second laser.

6. The ultrashort pulse laser processing device of claim 1 , wherein a nano-device is provided on a probe of the cantilevered nanoprobe microscope to be processed.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 30, 2013
From: KOREA INSTITUTE OF MACHINERY AND MATERIALS
To: INTELLECTUAL DISCOVERY CO., LTD.
Reel/Frame 030904/0355 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 21, 2009
From: CHANG, WON-SEOK; KIM, JAE-GU; CHO, SUNG-HAK
To: KOREA INSTITUTE OF MACHINERY & MATERIALS
Reel/Frame 023257/0175 →
Priority Claims (1)
KR 10-2007-0032330 · Apr 2, 2007 · national
Continuity (1)
Related Publication 20100108649A1 · May 6, 2010