VDMOS and JFET integrated semiconductor device
A semiconductor device. The semiconductor comprises a substrate, a VDMOS, a JFET, a first electrode, a second electrode, a third electrode and a fourth electrode. The VDMOS is formed in the substrate. The JFET is formed in the substrate. The first electrode, the second electrode and a third electrode are connected to the VDMOS and used as a first gate electrode, a first drain electrode and a first source electrode of the VDMOS respectively. The second electrode, the third electrode and the fourth electrode are connected to the JFET and used as a second drain electrode, a second gate electrode and a second source electrode of the JFET respectively.
1. A semiconductor device, comprising:
a substrate;
a first well, a second well and a third well, located at a top side of the substrate and separated from each other, the first well located between the second well and the third well;
a first doping region, a second doping region, a third doping region and a fourth doping region, the first doping region formed in the substrate and located between the first well and the third well, the second doping region formed in the first well, the third doping region formed in the second well, the fourth doping region formed in the substrate and located at a bottom side of the substrate;
a polysilicon layer, formed above the substrate and located above a gap between the second doping region and the third doping region; and
a first electrode, a second electrode, a third electrode and a fourth electrode, the first electrode electrically connected to the polysilicon layer, the second electrode electrically connected to the fourth doping region, the third electrode electrically connected to the third well, the second doping region and the third doping region, and the fourth electrode electrically connected to the first doping region;
wherein, the doping type of the substrate, the first doping region, the second doping region, the third doping region, and the fourth doping are the same and complementary to that of the first well, the second well and the third well.
2. The semiconductor device according to claim 1 , further comprising
a fifth doping region, a sixth doping region and a seventh doping region, the fifth doping region formed in the first well, the sixth doping region formed in the second well, and the seventh doping region formed in the third well.
3. The semiconductor device according to claim 2 , wherein the fifth doping region is connected to the second doping region, and the sixth doping region is connected to the third doping region.
4. The semiconductor device according to claim 2 , wherein the doping type of the fifth doping region, the sixth doping region and the seventh doping region are the same and complementary to that of the first doping region, the second doping region, the third doping region and the fourth doping region.
5. The semiconductor device according to claim 2 , wherein the distance between the second doping region and the third doping region is less than that of the fifth doping region and the sixth doping region.
6. The semiconductor device according to claim 2 , wherein the third electrode is also electrically connected to the fifth doping region, the sixth doping region and the seventh doping region.
7. The semiconductor device according to claim 1 , wherein the first doping region is separated from the first well and the third well.
8. The semiconductor device according to claim 1 , wherein each doping type of the substrate, the first doping region, the second doping region, the third doping region, and the fourth doping region is N type, and each doping type of the first well, the second well and the third well is P type.
9. The semiconductor device according to claim 1 , wherein each doping type of the substrate, the first doping region, the second doping region, the third doping region, and the fourth doping is region P type, and each doping type of the first well, the second well and the third well is N type.
10. A semiconductor device, comprising:
a substrate;
a VDMOS, formed in the substrate;
a JFET, formed in the substrate; and
a first electrode, a second electrode, a third electrode and a fourth electrode;
wherein, the first electrode, the second electrode and the third electrode are connected to the VDMOS and used as a first gate electrode, a first drain electrode and a first source electrode of the VDMOS respectively; and
the second electrode, the third electrode and the fourth electrode are connected to the JFET and used as a second drain electrode, a second gate electrode and a second source electrode of the JFET respectively.
11. The semiconductor device according to claim 10 , wherein the VDMOS comprises:
the substrate;
a first well and a second well, located at a top side of the substrate and separated from each other;
a second doping region and a third doping region, the second doping region formed in the first well, the third doping region formed in the second well; and
the first electrode, the second electrode and the third electrode.
12. The semiconductor device according to claim 11 , wherein the VDMOS further comprises:
a fifth doping region and a sixth doping region, the fifth doping region formed in the first well, the sixth doping region formed in the second well.
13. The semiconductor device according to claim 12 , wherein the JFET comprises:
the substrate;
the first well and a third well, located at the top side of the substrate and separated from each other, the first well located between the second well and the third well;
a first doping region and a fourth doping region, the first doping region formed in the substrate and located between the first well and the third well, the fourth doping region formed in the substrate and located at a bottom side of the substrate; and
the third electrode and the fourth electrode.
14. The semiconductor device according to claim 13 , wherein the JFET further comprises:
the fifth doping region and a seventh doping region, the fifth doping region formed in the first well, the seventh doping region formed in the third well.