Metal gate fill and method of making
The present disclosure provides various methods of fabricating a semiconductor device. A method of fabricating a semiconductor device includes providing a semiconductor substrate and forming a gate structure over the substrate. The gate structure includes a first spacer and a second spacer formed apart from the first spacer. The gate structure also includes a dummy gate formed between the first and second spacers. The method also includes removing a portion of the dummy gate from the gate structure thereby forming a partial trench. Additionally, the method includes removing a portion of the first spacer and a portion of the second spacer adjacent the partial trench thereby forming a widened portion of the partial trench. In addition, the method includes removing a remaining portion of the dummy gate from the gate structure thereby forming a full trench. A high k film and a metal gate are formed in the full trench.
1. A method of fabricating a semiconductor device comprising:
providing a semiconductor substrate;
forming a gate structure over the substrate, the gate structure including a first spacer, a second spacer formed apart from the first spacer, and a dummy gate between the first and second spacers;
removing a portion of the dummy gate from the gate structure thereby forming a partial trench;
removing a portion of the first spacer and a portion of the second spacer adjacent the partial trench thereby forming a widened portion of the partial trench;
removing a remaining portion of the dummy gate from the gate structure thereby forming a full trench;
forming a high k film in the full trench; and
forming a metal gate in the full trench.
2. The method of claim 1 , further comprising performing a chemical mechanical polishing (CMP) process to remove the widened portion of the partial trench after the forming of the metal gate.
3. The method of claim 1 , wherein the removing a portion of the first and second spacers is performed by etching the first and second spacers.
4. The method of claim 3 , wherein the etching is argon sputtering.
5. The method of claim 4 , wherein the argon sputtering is performed at a pressure of about 3-20 mTorr.
6. The method of claim 4 , wherein the argon sputtering is performed at an argon flow rate of about 300-600 sccm.
7. The method of claim 4 , wherein the argon sputtering is performed at a bias of about 200-500 Watts.
8. The method of claim 4 , wherein the argon sputtering is performed at a temperature of about 0-100° C.
9. The method of claim 4 , wherein the argon sputtering is performed for about 5-30 seconds.
10. A method of fabricating a semiconductor device comprising:
providing a semiconductor substrate;
forming an insulator over the substrate;
forming a first spacer over the insulator;
forming a second spacer apart from the first spacer over the insulator;
forming a dummy gate between the first and second spacers;
removing a portion of the dummy gate between the first and second spacers thereby forming a partial trench;
removing a portion of the first spacer and a portion of the second spacer adjacent the partial trench thereby forming a widened area between a portion of the first and second spacers;
removing a remaining portion of the dummy gate thereby forming a full trench; and
forming a metal gate in the full trench.
11. The method of claim 10 , further comprising performing a chemical mechanical polishing (CMP) process to remove a portion of the metal gate formed in the widened area.
12. The method of claim 10 , wherein the removing a portion of the first and second spacers is performed by etching the first and second spacers.
13. The method of claim 12 , wherein the etching is argon sputtering.
14. The method of claim 13 , wherein the argon sputtering is performed at a pressure of about 3-20 mTorr.
15. The method of claim 13 , wherein the argon sputtering is performed at an argon flow rate of about 300-600 sccm.
16. The method of claim 13 , wherein the argon sputtering is performed at a bias of about 200-500 Watts.
17. The method of claim 13 , wherein the argon sputtering is performed at a temperature of about 0-100° C.
18. The method of claim 13 , wherein the argon sputtering is performed for about 5-30 seconds.
19. A method of fabricating a semiconductor device comprising:
providing a substrate having a first region and a second region;
forming a first gate structure over the first region and a second gate structure over the second region, the first gate structure including a first spacer, a second spacer, and a first dummy gate, and the second gate structure including a third spacer, a fourth spacer, and a second dummy gate;
removing a portion of the first dummy gate from the first gate structure thereby forming a first partial trench and removing a portion of the second dummy gate from the second gate structure thereby forming a second partial trench;
removing a portion of the first and second spacers thereby forming a widened portion of the first partial trench and removing a portion of the third and fourth spacers thereby forming a widened portion of the second partial trench;
removing remaining portions of the first and second dummy gates thereby forming first and second full trenches;
forming a high k film in the first and second full trenches; and
forming metal gates in the first and second full trenches.
20. The method of claim 19 , further comprising performing a chemical mechanical polishing (CMP) process to the first, second, third and fourth spacers.