Semiconductor device including a transistor and a ferroelectric capacitor
According to an aspect of the present invention, there is provided a semiconductor device including: a transistor including: a source, a drain and a gate; first and second plugs on the source and the drain; a third plug on the gate to have a top face higher than that of the first plug; an interlayer insulating film covering the transistor and the first to the third plugs; a ferroelectric capacitor on the interlayer insulating film, one electrode thereof being connected to the first plug; a barrier film covering surfaces of the ferroelectric capacitor and the interlayer insulating film to prevent a substance affecting the ferroelectric capacitor from entering therethrough; and fourth and fifth plugs disposed on the second and the third plugs and connected thereto through connection holes formed in the barrier film.
1. A semiconductor device comprising:
a transistor including:
a first main electrode,
a second main electrode, and
a control electrode;
a first plug that is disposed on the first main electrode;
a second plug that is disposed on the second main electrode;
a third plug that is disposed on the control electrode;
an interlayer insulating film that is disposed to cover the transistor, the first plug, the second plug and the third plug;
a ferroelectric capacitor including:
a first electrode that is disposed on the interlayer insulating film and is electrically connected to the first plug,
a second electrode that is separated from the first electrode, and
a ferroelectric film that is disposed between the first electrode and the second electrode;
a barrier film that covers a surface of the ferroelectric capacitor and a surface of the interlayer insulating film and prevents a substance affecting a crystalline composition or a polarization characteristic of a ferroelectric from entering therethrough;
a fourth plug that is disposed on the second plug and is electrically connected to the second plug through a first connection hole disposed in the barrier film;
an eleventh plug that is disposed on the third plug below the barrier film;
a fifth plug that is disposed on the eleventh plug and is electrically connected to the eleventh plug through a second connection hole disposed in the barrier film; and
wherein a bottom face area of the eleventh plug is larger than a top face area of the third plug.
2. A semiconductor device comprising:
a transistor including:
a first main electrode,
a second main electrode, and
a control electrode;
a first plug that is disposed on the first main electrode;
a second plug that is disposed on the second main electrode;
a third plug that is disposed on the control electrode;
an interlayer insulating film that is disposed to cover the transistor, the first plug, the second plug and the third plug;
a ferroelectric capacitor including:
a first electrode that is disposed on the interlayer insulating film and is electrically connected to the first plug,
a second electrode that is separated from the first electrode, and
a ferroelectric film that is disposed between the first electrode and the second electrode;
a barrier film that covers a surface of the ferroelectric capacitor and a surface of the interlayer insulating film and prevents a substance affecting a crystalline composition or a polarization characteristic of a ferroelectric from entering therethrough;
a fourth plug that is disposed on the second plug and is electrically connected to the second plug through a first connection hole disposed in the barrier film;
an eleventh plug that is disposed on the third plug below the barrier film;
a fifth plug that is disposed on the eleventh plug and is electrically connected to the eleventh plug through a second connection hole disposed in the barrier film; and
wherein a bottom face area of the eleventh plug is larger by an alignment allowance dimension than a top face area of the third plug.