Electromagnetic heating
An apparatus for applying RF energy to an object, including at least one slower-scanning, frequency source and at least one faster-scanning frequency source, and a controller which sweeps a range of frequencies using the faster-scanning source to measure RF absorption and controls the slower-scanning frequency source based on the sweep.
1. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object,
wherein said second frequency source is a calibrated source, and
wherein said controller is configured to calibrate when said second source is not applying RF energy to said object.
2. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object; and
a plurality of output channels configured to apply RF energy,
wherein each of said output channels has its own antenna and the output channels are configured to apply RF energy to said object simultaneously.
3. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source;
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object; and
a plurality of output channels configured to apply RF energy,
wherein said second frequency source is shared by said plurality of channels.
4. Apparatus according to claim 3 , wherein each said channel includes a switch for selecting said second source.
5. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source;
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object; and
a plurality of output channels configured to apply RF energy,
wherein each said channel includes one of said at least one first source.
6. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object,
wherein said second, faster-scanning, frequency source is configured to be in operation and connected to a radiating output less than 15% of the time that the first, slower-scanning, frequency source is in operation.
7. An RF heater, comprising:
(a) a faster-scanning frequency source;
(b) a slower-scanning frequency source; and
(c) circuitry configured to calibrate said faster-scanning frequency source using said slower-scanning frequency source.
8. A heater according to claim 7 , comprising a second slower-scanning frequency source and wherein said circuitry is configured to perform said calibration when said second slower-scanning frequency source is in operation.
9. A heater according to claim 7 , comprising a calibration table matching control values to output frequency updated by said circuitry.
10. A heater according to claim 7 , wherein said calibrating comprises matching said faster-scanning frequency source to said slower-scanning frequency source.
11. A heater according to claim 7 , wherein said calibrating comprises matching said slower-scanning frequency source to said faster-scanning frequency source.
12. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object,
wherein said controller is configured to sweep the range of frequencies using the second, faster-scanning frequency source to measure at least one of:
a response of the object to the RF heater;
energy absorption efficiency;
input reflection coefficients; or
transfer coefficients.
13. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller which sweeps a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweeps controls said first slower-scanning frequency source to apply RF energy to said object,
wherein said controller is configured to control the first and second frequency sources, such that said faster-scanning frequency source operates for less than 10% of the total heating time.
14. An apparatus for applying RF energy to an object, comprising:
at least one first, slower-scanning, frequency source;
at least one second, faster-scanning, frequency source; and
a controller configured to sweep a range of frequencies using the second, faster-scanning frequency source to measure at least one RF interaction with the object and based on a measurement result of said sweep controls said first slower-scanning frequency source to apply RF energy to said object,
wherein said controller is configured to control the first and second frequency sources, such that said faster-scanning frequency source accounts for less than 10% of the energy output of the RF heater.