IP Library Granted Patent US 8,390,980
Granted Patent B2
US 8,390,980 · App. 12/539,410 · Granted Mar 5, 2013

Electrostatic chuck assembly

Inventors: Steven V. Sansoni (Livermore, CA); Cheng-Hsiung Tsai (Cupertino, CA); Shambhu N. Roy (San Jose, CA); Karl M. Brown (Mountain View, CA); Vijay D. Parkhe (San Jose, CA); Hari Ponnekanti (San Jose, CA)
Assignee: Applied Materials, Inc.
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Quick Facts
Patent No.
US 8,390,980
App. No.
12/539,410
Granted
Mar 5, 2013
Kind
B2
Abstract

Embodiments of the present invention provide a cost effective electrostatic chuck assembly capable of operating over a wide temperature range in an ultra-high vacuum environment while minimizing thermo-mechanical stresses within the electrostatic chuck assembly. In one embodiment, the electrostatic chuck assembly includes a dielectric body having chucking electrodes which comprise a metal matrix composite material with a coefficient of thermal expansion (CTE) that is matched to the CTE of the dielectric body.

Claims (15)

1. An electrostatic chuck assembly, comprising:

a support housing;

a puck comprising:

an electrically insulative upper puck plate having one or more chucking electrodes and one or more heating elements;

a lower puck plate bonded to the upper puck plate within a bonding region comprising a raised portion; and

a gap separating the upper puck plate from the lower puck plate outside the bonding region;

one or more o-rings disposed between the lower puck plate and support housing; and

a cooling plate comprising one or more cooling channels and disposed between the bonding region and the one or more o-rings, said cooling plate coupled to and in thermal communication with the lower puck plate.

2. The electrostatic chuck assembly of claim 1 , wherein the one or more o-rings are located in proximity to the periphery of the lower puck plate, and the cooling plate is located in proximity to the one or more o-rings.

3. The electrostatic chuck assembly of claim 1 , wherein the upper puck plate comprises at least one of aluminum oxide, aluminum nitride, titanium oxide, silicon carbide, and silicon nitride.

4. The electrostatic chuck assembly of claim 1 , wherein the lower puck plate comprises a metal matrix composite material.

5. The electrostatic chuck assembly of claim 1 , wherein the gap thickness is between about 20 microns and about 1000 microns.

6. The electrostatic chuck assembly of claim 1 , wherein the raised portion comprises an interlayer of aluminum.

7. The electrostatic chuck assembly of claim 1 , wherein the bonding region comprises a thermal choke.

8. The electrostatic chuck assembly of claim 1 , wherein the upper puck plate and lower puck plate are free to expand and contract independently outside of the bonding region during thermal cycling.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 27, 2009
From: SANSONI, STEVEN V.; TSAI, CHENG-HSIUNG; ROY, SHAMBHU N.; BROWN, KARL M.; PARKHE, VIJAY D.; PONNEKANTI, HARI
To: APPLIED MATERIALS, INC.
Reel/Frame 023432/0176 →
Continuity (2)
Provisional Application 61088289 · Aug 12, 2008
Related Publication 20100039747A1 · Feb 18, 2010