Group III nitride semiconductor device and epitaxial substrate
Affords Group III nitride semiconductor devices in which the leakage current from the Schottky electrode can be reduced. In a high electron mobility transistor 11 , a supporting substrate 13 is composed of AlN, AlGaN, or GaN, specifically. An Al Y Ga 1−Y N epitaxial layer 15 has a full-width-at-half maximum of (0002) plane XRD of 150 sec or less. A GaN epitaxial layer 17 is provided between the gallium nitride supporting substrate and the Al Y Ga 1−Y N epitaxial layer (0<Y≦1). A Schottky electrode 19 is provided on the Al Y Ga 1−Y N epitaxial layer 15 . The Schottky electrode 19 constitutes a gate electrode of the high electron mobility transistor 11 . The source electrode 21 is provided on the gallium nitride epitaxial layer 15 . The drain electrode 23 is provided on the gallium nitride epitaxial layer 15.
1. A Group III nitride semiconductor device characterized in being furnished with:
a supporting substrate composed of GaN, said supporting substrate having a screw dislocation density of not greater than 1×10 8 cm −2 and a carrier concentration of not greater than 1×10 19 cm −3 ;
an undoped gallium nitride homoepitaxial layer provided on said substrate, said gallium nitride homoepitaxial layer having a thickness of from 0.5 μm to 1000 μm and a carrier concentration of not greater than 1×10 17 cm −3 ; and
an Al y Ga 1−y N (0.1≦y≦0.7) epitaxial layer having a thickness of from 5 nm to 50 nm and a carrier concentration of not greater than 1×10 19 cm −3 , provided on said gallium nitride homoepitaxial layer; whereby
said Al y Ga 1−y N (0.1≦y≦0.7) epitaxial layer has a full-width at half-maximum for (0002) plane XRD of 150 arcsec or less;
a Schottky electrode provided on said Al y Ga 1−y N (0.1≦y≦0.7) epitaxial layer;
a source electrode provided on said Al y Ga 1−y N (0.1≦y≦0.7) epitaxial layer; and
a drain electrode provided on said Al y Ga 1−y N (0.1≦y≦0.7) epitaxial layer.
2. An epitaxial substrate for a Group III nitride semiconductor device, said epitaxial substrate characterized in being furnished with:
a substrate composed of GaN, said substrate having a screw dislocation density of not greater than 1×10 8 cm −2 and a carrier concentration of not greater than 1×10 19 cm −3 ;
an undoped gallium nitride homoepitaxial film provided on said substrate, said gallium nitride homoepitaxial film having a thickness of from 0.5 μm to 1000 μm and a carrier concentration of not greater than 1×10 17 cm −3 ; and
an Al y Ga 1−y N (0.1≦y≦0.7) epitaxial film having a thickness of from 5 nm to 50 nm and a carrier concentration of not greater than 1×10 19 cm −3 , provided on said gallium nitride homoepitaxial film; whereby
said Al y Ga 1−y N (0.1≦y≦0.7) epitaxial film has a full-width at half-maximum for (0002) plane XRD of 150 arcsec or less.