Germs resisting and self cleaning infiltration thin film and manufacturing method thereof
The invention provides a germs resisting and self-cleaning infiltration thin film and manufacturing method thereof. At first, a Polyethyleneimine (PEI) and a Polyvinyl Alcohol (PVA) are used to make a polymer thin film. Then, a germ resistant and an inorganic metal oxide are added into the polymer thin film to form the selective infiltration thin film capable of resisting germs and self-cleaning.
1. A method of manufacturing a selective infiltration thin film of a specific, pre-determined diameter D (in mm) of the bacteriostatic circle at a constant temperature 37° C., comprising the steps of
(a) mixing Polyethyleneimine (PEI) and Polyvinyl Alcohol (PVA) with a casting method for a polymer thin film;
(b) setting a value of r ranging between 0 and 1, and rεR, or real numbers;
(c) Obtaining a value of M in Pearson's product-moment formula, M=r·D, and adding an amount M of an inorganic metal oxide, namely, Polyoxometalate (POM) into the polymer thin film;
(d) forming the selective infiltration thin film,
wherein the desired diameter D of the bacteriostatic circle of the thin film corresponds to a diameter D′ obtained according to the following steps:
i) sterilizing a wafer paper spindles (6 mm) at 120° C.,
ii) immersing the wafer paper spindles into the thin film,
iii) disposing the wafer paper spindles in a vaccinated strain (10 5 cfu/ml) Mueller Hinton ager (MHA) disk, and
after 24 hours of training of the wafer paper spindles in a constant temperature incubator at 37° C., measuring the diameter D′ of the bacteriostatic circle.
2. A method of manufacturing a selective infiltration thin film of a specific, pre-determined diameter D (in mm) of the bacteriostatic circle at a constant temperature 37° C., comprising the steps of
(a) mixing Polyethyleneimine (PEI) and Polyvinyl Alcohol (PVA) with a casting method for a polymer thin film;
(b) setting a value of r ranging between 0 and 1, and rεR, or real numbers;
(c) Obtaining a value of M in Pearson's product-moment formula, M=r·D, and
adding an amount M of a germ resistance containing silver ion (Ag+) into the polymer thin film;
(d) forming the selective infiltration thin film,
wherein the desired diameter D of the bacteriostatic circle of the thin film corresponds to a diameter D′ obtained according to the following steps:
iv) sterilizing a wafer paper spindles (6 mm) at 120° C.,
v) immersing the wafer paper spindles into the thin film,
vi) disposing the wafer paper spindles in a vaccinated strain (10 5 cfu/ml) Mueller Hinton ager (MHA) disk, and
after 24 hours of training of the wafer paper spindles in a constant temperature incubator at 37° C., measuring the diameter D′ of the bacteriostatic circle.