IP Library Granted Patent US 8,462,329
Granted Patent B2
US 8,462,329 · App. 13/187,375 · Granted Jun 11, 2013

Multi-spot illumination for wafer inspection

Inventors: Guoheng Zhao (Milpitas, CA); Azmi Kadkly (Santa Clara, CA)
Assignee: KLA-Tencor Corp.
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Quick Facts
Patent No.
US 8,462,329
App. No.
13/187,375
Granted
Jun 11, 2013
Kind
B2
Abstract

Illumination subsystems for multi-spot wafer inspection are provided.

Claims (14)

1. An illumination on subsystem configured to provide illumination for wafer inspection, comprising:

a diffractive optical element configured to separate an illumination light beam into multiple light beams;

a compensating diffractive optical element positioned in the path of the multiple light beams, wherein the compensating diffractive optical element has the same diffraction angle as the diffractive optical element but reverse in diffraction order; and

one or more refractive optical elements positioned in the path of the multiple light beams exiting the compensating diffractive optical element and configured to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.

2. The illumination subsystem of claim 1 , wherein the illumination light beam is provided by a pulsed laser and has a central wavelength of 266 nm.

3. The illumination subsystem of claim 1 , wherein the bandwidth of the illumination light beam is equal to or greater than 10 pm.

4. The illumination subsystem of claim 1 , wherein the compensating diffractive optical element diffracts only one diffraction order of each of the multiple light beams.

5. The illumination subsystem of claim 1 , wherein the compensating diffractive optical element is a transmission grating that satisfies the Bragg condition.

6. The illumination subsystem of claim 1 , wherein the compensating diffractive optical element is a blazed transmission grating.

7. The illumination subsystem of claim 1 , wherein the compensating diffractive optical element includes multiple gratings having different pitches.

8. The illumination subsystem of claim 1 , wherein the one or more refractive optical elements comprise a lens array configured to separately and simultaneously focus each of the multiple light beams to the wafer.

9. The illumination subsystem of claim 1 , wherein the multiple light beams are spatially separated from each other at the compensating diffractive optical element and at the one or more refractive optical elements.

10. The illumination subsystem of claim 1 , wherein the one or more refractive optical elements comprise a lens array configured to separately and simultaneously focus each of the multiple light beams and relay optics configured to separately and simultaneously relay the focused multiple light beams from the lens array to the wafer.

11. The illumination subsystem of claim 1 , wherein the compensating diffractive optical element is a one-dimensional chirped grating, and wherein the one or more refractive optical elements comprise a cylindrical lens.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2011
From: ZHAO, GUOHENG; KADKLY, AZMI
To: KLA-TENCOR CORPORATION
Reel/Frame 026625/0246 →
Continuity (2)
Provisional Application 61369638 · Jul 30, 2010
Related Publication 20120026489A1 · Feb 2, 2012