Transparent conductors incorporating additives and related manufacturing methods
A transparent conductor includes a film of a conductive ceramic. Additives are at least partially incorporated into the film. The additives are at least one of electrically conductive and semiconducting, and at least one of the additives has an aspect ratio of at least 3.
1. A transparent conductor comprising:
a film of a conductive ceramic; and
additives at least partially incorporated into the film, the additives are at least one of electrically conductive and semiconducting, and at least one of the additives has an aspect ratio of at least 3, wherein the transparent conductor has a sheet resistance that is no greater than 1/10 of an intrinsic sheet resistance of the film, wherein the additives are at least partially embedded into the film and localized within an embedded region of the film, and a thickness of the embedded region is less than an overall thickness of the film.
2. The transparent conductor of claim 1 , wherein the thickness of the embedded region is no greater than 30% of the overall thickness of the film.
3. A transparent conductor comprising:
a film of a ceramic material, the film having an embedding surface and including partially fused nanostructures of the ceramic material; and
additives partially embedded into the film and localized within an embedded region adjacent to the embedding surface, wherein a thickness of the embedded region is no greater than 50% of an overall thickness of the film, the additives are at least one of electrically conductive and semiconducting,
further comprising an over-coating adjacent to the embedding surface and covering portions of the additives exposed from the ceramic material, wherein the ceramic material is a first ceramic material, and the over-coating includes a second ceramic material, wherein the first ceramic material and the second ceramic material are different.
4. A transparent conductor comprising:
a film of a ceramic material, the film having an embedding surface and including partially fused nanostructures of the ceramic material; and
additives partially embedded into the film and localized within an embedded region adjacent to the embedding surface, wherein a thickness of the embedded region is no greater than 50% of an overall thickness of the film, the additives are at least one of electrically conductive and semiconducting,
further comprising an over-coating adjacent to the embedding surface and covering portions of the additives exposed from the ceramic material, wherein the ceramic material is a first ceramic material, and the over-coating includes a second ceramic material, wherein the second ceramic material has a dielectric constant in a range of 1.5 to 30.