Resist composition and method for producing resist pattern
A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. wherein R 1 represents a hydrogen atom or a methyl group; A 1 represents a C 1 to C 6 alkanediyl group; R 2 represents a C 1 to C 10 hydrocarbon group having a fluorine atom.
1. A resist composition comprising
(A1) a resin having a structural unit represented by the formula (I),
(A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and
(B) an acid generator having an acid-labile group;
wherein R 1 represents a hydrogen atom or a methyl group;
A 1 represents a C 1 to C 6 alkanediyl group;
R 2 represents a C 1 to C 10 hydrocarbon group having a fluorine atom.
2. The resist composition according to claim 1 , wherein the acid generator (B) is an acid generator represented by the formula (II-0);
wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
L 01 represents a single bond or an optionally substituted C 1 to C 20 divalent hydrocarbon group, and one or more —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O— or —CO—;
R 4 represents a C 1 to C 12 hydrocarbon group;
ring W 1 represents an optionally substituted C 3 to C 18 hydrocarbon ring;
Z + represents an organic cation.
3. The resist composition according to claim 1 , wherein the acid generator (B) is an acid generator represented by the formula (II);
wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
L 1 represents a single bond or a C 1 to C 10 alkanediyl group, and one or more —CH 2 — contained in the alkanediyl group may be replaced by —O— or —CO—;
R 4 represents a C 1 to C 12 hydrocarbon group;
ring W 1 represents an optionally substituted C 3 to C 18 hydrocarbon ring;
Z + represents an organic cation.
4. The resist composition according to claim 1 , wherein R 2 in the formula (I) is a C 1 to C 6 fluorinated alkyl group.
5. The resist composition according to claim 1 , wherein A 1 in the formula (I) is a C 2 to C 4 alkanediyl group.
6. The resist composition according to claim 3 , wherein L 1 in the formula (II) is a single bond or *—CO—O-L 11 , wherein L 11 represents a C 1 to C 6 alkanediyl group, * represents a bond to —CQ 1 Q 2 -.
7. The resist composition according to claim 1 , which further comprises a solvent.
8. A method for producing resist pattern comprising steps of;
(1) applying the resist composition of claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.