Processess and compositions for removing substances from substrates
Processes associated apparatus and compositions useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
1. A single-stage process for removing a substance from a substrate comprising,
(a) coating the substance with a stripping composition to a thickness of 1000 microns or less, wherein said stripping composition comprises:
i. at least one organic solvent at a weight percent ranging from 0.5% to 99.5%, and
ii. at least one water soluble, water dispersible, or water dissipatable sulfonated polymer or sulfonated monomer at weight percent ranging from 0.1% to 99.5%;
(b) heating the substrate to a temperature and for a time sufficient to release the substance, and
(c) rinsing the substrate with a volume of a rinsing agent sufficient to remove the composition and the substance;
wherein the process is a single-stage process comprising (a), (b), and (c).
2. The process of claim 1 , wherein the thickness of the stripping composition is 800 microns or less.
3. The process of claim 2 , wherein the thickness of the stripping composition if 600 microns or less.
4. The process of claim 3 , wherein the thickness of the stripping composition is 400 microns or less.
5. The process of claim 1 , wherein the single-stage process is carried out in a single bowl.
6. The process of claim 1 , wherein the substrate is preheated before coating with the stripping composition.
7. The process of claim 1 , wherein the stripping composition is preheated before it is coated on the substance.
8. The process of claim 1 , wherein the substrate is subjected to a second cycle of coating, heating, and rinsing.
9. The process of claim 8 , wherein the stripping composition used in second cycle is different from the stripping composition used in the first cycle.
10. The process of claim 1 , further comprising drying the substrate after rinsing.
11. The process of claim 10 , wherein drying is selected from contacting the substrate with heated nitrogen or applying to the substrate acetone or isopropyl alcohol.
12. A process for removing a substance from a substrate comprising,
(a) coating the substance with a stripping composition to a thickness of 1000 microns or less, wherein said stripping composition comprises:
i. at least one organic solvent at a weight percent ranging from 0.5% to 99.5%, and
ii. at least one water soluble, water dispersible, or water dissipatable sulfonated polymer or sulfonated monomer at weight percent ranging from 0.1% to 99.5%,
(b) heating the substrate to a temperature above the flashpoint of the organic solvent for a time sufficient to release the substance, and
(c) rinsing the substrate with a volume of a rinsing agent sufficient to remove the composition and the substance,
wherein the process is a single-stage process comprising (a), (b), and (c).
13. The process according to claim 12 , wherein the substrate is heated to a temperature ranging from 100° C. to 200° C.
14. The process according to claim 12 , wherein the substance to be removed is an organic substance.
15. The process according to claim 12 , wherein the substance to be removed is a photoresist.
16. A process for removing a substance from a substrate comprising,
(a) coating the substance with a stripping composition comprising a hydrotrope to a thickness of 1000 microns or less;
(b) heating the substrate to a temperature and for a time sufficient to release the substance from the substrate, and
(c) rinsing the substrate with a volume of a rinsing agent sufficient to remove the composition and the substance, wherein the rinsing agent comprises at least one surfactant or organic solvent;
wherein the process is a single-stage process comprising (a), (b), and (c).
17. The process of claim 16 , wherein the stripping composition contains at least one organic solvent.
18. The process of claim 17 , wherein the substrate is heated to a temperature above the flash point of the organic solvent.
19. The process of claim 16 , further comprising a drying step.
20. The process of claim 19 , wherein the drying step is a physical drying step, a chemical drying step, or a combination thereof.
21. The process of claim 16 , wherein the process includes the application of megasonics.
22. The process of claim 16 , wherein the rinsing step is followed by another rinse in water, acetone, or isopropyl alcohol.