Optical designs for zero order reduction
Apparatus for projecting a pattern includes a first diffractive optical element (DOE) configured to diffract an input beam so as to generate a first diffraction pattern on a first region of a surface, the first diffraction pattern including a zero order beam. A second DOE is configured to diffract the zero order beam so as to generate a second diffraction pattern on a second region of the surface such that the first and the second regions together at least partially cover the surface.
1. Apparatus for projecting a pattern, comprising:
a first diffractive optical element (DOE) configured to diffract an input beam so as to generate a first diffraction pattern on a first region of a surface, the first diffraction pattern comprising a zero order beam; and
a second DOE, which comprises:
an optically active region configured to receive the zero order beam and to diffract the zero order beam so as to generate a second diffraction pattern on a second region of the surface; and
an optically inactive transparent region configured to transmit the first diffraction pattern absent the zero order beam so that the first diffraction pattern is unaltered by the optically inactive transparent region,
such that the first and the second regions together at least partially cover the surface.
2. The apparatus according to claim 1 , wherein the first and the second DOEs are formed on one optical element.
3. The apparatus according to claim 1 , wherein the first and the second DOEs are formed on separate optical elements.
4. The apparatus according to claim 1 , wherein the second diffraction pattern comprises a further zero order beam, and wherein an energy flux of the further zero order beam is less than 0.1% of an energy flux of the input beam.
5. The apparatus according to claim 1 , wherein the input beam has an input beam wavelength, and wherein the first DOE and the second DOE are configured so that the first and the second regions at least partially cover the surface independently of the input beam wavelength.
6. The apparatus according to claim 1 , wherein the first diffraction pattern forms a first diffraction image comprising a first set of first spots on the first region, and wherein the second diffraction pattern forms a second diffraction image comprising a second set of second spots on the second region.
7. The apparatus according to claim 1 , wherein at least one of the first and the second diffraction patterns forms a diffraction image comprising at least one of a set of lines and an area having graduated intensities.
8. The apparatus according to claim 1 , wherein the first region and the second region tile the surface.
9. The apparatus according to claim 1 , wherein the first region is bounded by a first rectangle and a second rectangle smaller than the first rectangle, the first and the second rectangles having a common center, and wherein the second region is bounded by the second rectangle.
10. The apparatus according to claim 1 , wherein the optically active region of the second DOE is configured to correspond to a cross-section of the zero order beam.
11. A method for projecting a pattern, comprising:
diffracting an input beam with a first diffractive optical element (DOE) so as to generate a first diffraction pattern on a first region of a surface, the first diffraction pattern comprising a zero order beam; and
diffracting the zero order beam with a second DOE, which comprises:
an optically active region configured to receive and diffract the zero order beam so as to generate a second diffraction pattern on a second region of the surface; and
an optically inactive transparent region configured to transmit the first diffraction pattern absent the zero order beam so that the first diffraction pattern is unaltered by the optically inactive transparent region,
such that the first and the second regions together at least partially cover the surface.
12. The method according to claim 11 , wherein the optically active region of the second DOE is configured to correspond to a cross-section of the zero order beam.
13. The method according to claim 11 , wherein the second diffraction pattern comprises a further zero order beam, and wherein an energy flux of the further zero order beam is less than 0.1% of an energy flux of the input beam.
14. The method according to claim 11 , wherein the first diffraction pattern forms a first diffraction image comprising a first set of first spots on the first region, and wherein the second diffraction pattern forms a second diffraction image comprising a second set of second spots on the second region.
15. The method according to claim 11 , wherein the first region and the second region tile the surface.
16. The method according to claim 11 , wherein the first region is bounded by a first rectangle and a second rectangle smaller than the first rectangle, the first and the second rectangles having a common center, and wherein the second region is bounded by the second rectangle.