IP Library Granted Patent US 8,748,873
Granted Patent B2
US 8,748,873 · App. 13/011,130 · Granted Jun 10, 2014

Electronic device with dual semiconducting layer

Inventors: Yiliang Wu (Oakville, CA); Ping Liu (Mississauga, CA); Nan-Xing Hu (Oakville, CA)
Assignee: Samsung Electronics Co., Ltd.
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Quick Facts
Patent No.
US 8,748,873
App. No.
13/011,130
Granted
Jun 10, 2014
Kind
B2
Abstract

A thin film transistor has a dual semiconducting layer comprising two semiconducting sublayers. The first sublayer comprises a polythiophene and carbon nanotubes. The second sublayer comprises the polythiophene and has no carbon nanotubes. Devices comprises the dual semiconducting layer exhibit high mobility.

Claims (39)

1. An electronic device including a semiconducting bilayer, the semiconducting bilayer comprising:

a first sublayer including a first semiconductor and carbon nanotubes, the first semiconductor being a polythiophene; and

a second sublayer including a second semiconductor and not containing carbon nanotubes,

wherein the carbon nanotubes include from about 15 to about 40 wt % of the first sublayer, based on a total weight of the first semiconductor and the carbon nanotubes.

2. The electronic device of claim 1 , wherein the second semiconductor is a polythiophene.

3. The electronic device of claim 2 , wherein the first semiconductor polythiophene and the second semiconductor polythiophene each have the structure of Formula (II):

wherein m is from 2 to about 2,500.

4. The electronic device of claim 1 , wherein the first semiconductor polythiophene and the second semiconductor independently have a structure of Formula (I):

wherein A is a divalent linkage; each R is independently selected from hydrogen, alkyl, substituted alkyl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, aryl, substituted aryl, alkoxy, substituted alkoxy, a heteroatom-containing group, halogen, —CN, or —NO 2 ; and n is from 2 to about 5,000.

5. The electronic device of claim 4 , wherein R is alkyl having from about 6 to about 25 carbon atoms.

6. The electronic device of claim 1 , wherein the first sublayer comprises polymer aggregates of the first semiconductor separating the carbon nanotubes.

7. The electronic device of claim 1 , wherein the first sublayer comprises nano aggregates formed by the first semiconducting polymer wrapping around a carbon nanotube.

8. The electronic device of claim 1 , wherein the first sublayer has a thickness of less than 10 nanometers.

9. The electronic device of claim 1 , wherein the carbon nanotubes are surface-modified carbon nanotubes.

10. The electronic device of claim 1 , wherein the carbon nanotubes are single-wall carbon nanotubes.

11. The electronic device of claim 1 , further comprising a dielectric layer; wherein the first sublayer contacts the dielectric layer.

12. A process for producing a semiconductor layer of an electronic device, the process comprising:

liquid depositing a first semiconducting composition onto a dielectric layer to form a first semiconducting sublayer;

optionally drying the first sublayer; and

liquid depositing a second semiconducting composition onto the first semiconducting sublayer to form a second semiconducting sublayer;

wherein the first semiconducting sublayer includes a first polythiophene and carbon nanotube,

wherein the carbon nanotubes include from about 15 to about 40 wt % of the first semiconducting sublayer, based on a total weight of the first polythiophene and the carbon nanotubes,

wherein the second semiconducting sublayer includes a second polythiophene and does not contain carbon nanotubes; and

optionally annealing the first sublayer and the second sublayer together to form the semiconductor layer.

13. The process of claim 12 , wherein the first polythiophene has the structure of Formula (II):

wherein m is from 2 to about 2,500.

14. A thin-film transistor, comprising:

a dielectric layer and a semiconducting bilayer,

wherein the semiconducting bilayer includes,

a first sublayer including a first semiconductor polythiophene and carbon nanotubes, and

a second sublayer including a second semiconductor and not containing carbon nanotubes,

wherein the first sublayer is between the dielectric layer and the second sublayer,

wherein the first polythiophene has the structure of Formula (I):

wherein A is a divalent linkage; each R is independently selected from hydrogen, alkyl, substituted alkyl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, aryl, substituted aryl, alkoxy, substituted alkoxy, a heteroatom-containing group, halogen, —CN, or —NO 2 ; and n is from 2 to about 5,000, and

wherein the carbon nanotubes include from about 15 to about 40 wt % of the first sublayer, based on a total weight of the first semiconductor polythiophene and the carbon nanotubes.

15. The thin-film transistor of claim 14 , wherein the second semiconductor is the same as the first semiconductor polythiophene.

16. The thin-film transistor of claim 14 , wherein the first semiconductor polythiophene and the second semiconductor independently have the structure of Formula (II):

wherein m is from 2 to about 2,500.

17. The thin-film transistor of claim 14 , wherein the carbon nanotubes are single-wall carbon nanotubes, and the first sublayer has a thickness of less than 10 nm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 3, 2013
From: XEROX CORPORATION
To: SAMSUNG ELECTRONICS CO. LTD.
Reel/Frame 030733/0970 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 21, 2011
From: WU, YILIANG; LIU, PING; HU, NAN-XING
To: XEROX CORPORATION
Reel/Frame 025677/0035 →
Continuity (1)
Related Publication 20120187379A1 · Jul 26, 2012