Sn based alloys with fine compound inclusions for Nb
A method for producing a Sn based alloy ( 15 ) comprising a metal matrix of a metal matrix material, wherein the metal matrix material comprises Sn, and inclusions of a compound material, further referred to as compound inclusions, wherein the compound material contains one element or a combination of elements of the group Ti, V, Zr, Hf, further referred to as dopant, and one or a plurality of other elements, in particular Sn, Cu and/or Nb. Particles of the metal matrix material, further referred to as matrix particles, are mixed with particles of the compound material, further referred to as compound particles, and the matrix particles and the compound particles are compacted during and/or after their mixing. A Sn based alloy containing finer compound inclusion of a dopant can be prepared, in order to produce Nb 3 Sn superconductor material with a superior current carrying capacity.
1. A method for producing a Sn based alloy, the method comprising the steps of:
a) selecting a metal matrix material comprising Sn;
b) selecting a compound material of solid compound particles for inclusion into the metal matrix material as a dopant, thereby forming compound inclusions, the compound material being composed of one or more elements, one of these elements being selected from the group consisting of Ti, V, Hf and Zr;
c) liquefying the metal matrix material;
d) spraying the liquefied metal matrix material in a directed jet of matrix material droplets onto a target; and
e) spraying, during step d), a directed jet of the solid compound particles onto the target, thereby effecting a mixing of matrix particles derived from the droplets of liquid metal matrix material with the solid compound particles, wherein fractions of all elements in the compound material and relative mass flows of the jet of matrix material droplets and the jet of solid compound particles are chosen such that a resulting Sn based alloy has a total content of 0.5 to 10 atomic % of the element selected from the group consisting of Ti, V, Hf and Zr.
2. The method of claim 1 , wherein one or more other elements in the compound material are selected from the group consisting of Sn, Cu and Nb.
3. The method of claim 1 , wherein, in step c), the metal matrix material is melted and heated to a temperature of not more than 600° C.
4. The method of claim 1 , wherein the target is a rotating table.
5. The method of claim 1 , wherein the target is cooled.
6. The method of claim 1 , wherein the matrix particles have a maximum diameter of 200 μm or of 100 μm.
7. The method of claim 1 , wherein the compound particles have a maximum diameter of 10 μm or of 5 μm.
8. The method of claim 1 , wherein the compound inclusions have a diameter of 10 μm or less or of 5 μm or less.
9. The method of claim 1 , wherein the metal matrix material further comprises 0.1 to 20 atomic % of Cu.
10. The method of claim 1 , wherein the metal matrix material further comprises 0 to 5 atomic % of elements which are not selected from the group consisting of Sn, Ti, V, Hf, Zr, Cu and Nb.