Trench MOSFET device and method for fabricating the same

1. A trench Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) device, comprising:

a substrate including a substrate layer and an epitaxial layer formed on the substrate layer;

a body region formed in the epitaxial layer;

a source region formed in the body region of the epitaxial layer;

a dielectric layer formed on the epitaxial layer;

a metal layer formed on the dielectric layer;

a contact hole formed in the dielectric layer to connect the source region with the metal layer; and

a trench structure formed in the epitaxial layer,

wherein the trench structure includes a first trench that is a pectinate trench including a plurality of tooth trenches and a bar trench interconnecting the plurality of tooth trenches, wherein a total length of all of the plurality of tooth trenches corresponds to a channel width of the MOSFET device, and

wherein the channel width is equal to a contact hole side outer perimeter of the trench structure.

2. The trench MOSFET device according to claim 1 , wherein the trench structure further includes:

a second trench in a shape of one of a square, a hexagon, and a circle, the second trench being connected to the first trench.

3. The trench MOSFET device according to claim 2 , wherein:

a length of middle tooth trenches is less than a length of an edge tooth trenches such that tooth trenches from different cells can be distinguished.

4. The trench MOSFET device according to claim 1 , wherein the trench structure further includes:

a second trench that is also a pectinate trench and arranged symmetrically with the first trench to form a symmetric trench pair along a symmetric line; and

the contract hole is located on the symmetric line.

5. The trench MOSFET device according to claim 1 , wherein the trench structure further includes:

a second trench that is also a pectinate trench and arranged asymmetrically with the first trench to form an asymmetric trench pair with the plurality of tooth trenches of the first trench meshing with the plurality of tooth trenches of the second trench.

6. The trench MOSFET device according to claim 1 , wherein:

a total number of the plurality of tooth trenches is six; and

the contact hole is located in the middle of the plurality of tooth trenches.

7. The trench MOSFET device according to claim 1 , wherein:

the trench structure is filled with gate oxide and polysilicon to form a gate region of the MOSFET device controlling a channel of the MOSFET device.

8. The trench MOSFET device according to claim 1 , further including:

a drain formed on a back side of the substrate layer.

9. A method for fabricating a trench Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) device, comprising:

providing a substrate including a substrate layer and an epitaxial layer formed on the substrate layer;

forming a trench structure in the epitaxial layer using a trench pattern, wherein the trench pattern includes a first pattern for a first trench that is a pectinate trench including a plurality of tooth trenches and a bar trench interconnecting the plurality of tooth trenches, wherein a total length of all of the plurality of tooth trenches corresponds to a channel width of the MOSFET device, and

wherein the channel width is equal to a contact hole side outer perimeter of the trench structure;

forming a body region in the epitaxial layer;

forming a source region in the body region of the epitaxial layer;

forming a dielectric layer on the epitaxial layer;

forming a contact hole formed in the dielectric layer; and

forming a metal layer on the dielectric layer, wherein the contact hole is filled with metal material to connect the source region with the metal layer.

10. The method according to claim 9 , wherein the trench pattern further includes:

a second pattern for a second trench in a shape of one of a square, a hexagon, and a circle, the second trench being connected to the first trench.

11. The method according to claim 9 , wherein the trench pattern further includes:

a second pattern for a second trench that is also a pectinate trench and arranged symmetrically with the first trench to form a symmetric trench pair along a symmetric line; and

the contract hole is located on the symmetric line.

12. The method according to claim 9 , wherein the trench pattern further includes:

a second pattern for a second trench that is also a pectinate trench and arranged asymmetrically with the first trench to form an asymmetric trench pair with the plurality of tooth trenches of the first trench meshing with the plurality of tooth trenches of the second trench.

13. The method according to claim 9 , wherein:

a total number of the plurality of tooth trenches is six; and

the contact hole is located in the middle of the plurality of tooth trenches.

14. The method according to claim 9 , further including:

filling the trench structure with gate oxide and polysilicon to form a gate region of the MOSFET device controlling a channel of the MOSFET device.

15. The trench MOSFET device according to claim 1 , wherein the trench structure further includes a second trench, the second trench including an opened square trench connecting with the bar trench of the first trench.

16. The trench MOSFET device according to claim 2 , wherein the second trench connects with the bar trench of the first trench.

17. The trench MOSFET device according to claim 1 , wherein the trench structure further includes a second trench, the second trench including a portion of a square trench connecting with the bar trench of the first trench.

18. The trench MOSFET device according to claim 4 , wherein the second trench is arranged symmetrically mirroring with the first trench.

19. The trench MOSFET device according to claim 4 , wherein each of the first trench and the second trench further includes an additional trench having a shape of one of a square, a hexagon, and a circle, the additional trench connecting with the bar trench of each of the first trench and the second trench.