Method for the reuse of gallium nitride epitaxial substrates
A method for the reuse of gallium nitride (GaN) epitaxial substrates uses band-gap-selective photoelectrochemical (PEC) etching to remove one or more epitaxial layers from bulk or free-standing GaN substrates without damaging the substrate, allowing the substrate to be reused for further growth of additional epitaxial layers. The method facilitates a significant cost reduction in device production by permitting the reuse of expensive bulk or free-standing GaN substrates.
1. A device, comprising:
a III-nitride epitaxial film grown on or above a used III-nitride substrate, wherein the epitaxial film comprises an optoelectronic, electronic, or thermoelectric device structure and the device structure's performance is not degraded as compared to a device structure grown on a new or non-used III-nitride substrate.
2. The device of claim 1 , wherein the epitaxial film is grown on an etched or etched and polished surface of the substrate.
3. The device of claim 2 , wherein the surface is epitaxy ready, with no difference in crystal quality, doping, and surface roughness as compared to a new epitaxy ready substrate.
4. The device of claim 1 , wherein the substrate is a bulk or free standing III-nitride substrate.
5. The device of claim 4 , wherein the substrate is Gallium Nitride.
6. A device, comprising:
a III-nitride epitaxial film grown on or above a used III-nitride substrate, wherein the substrate has been used to grow at least 20 devices.
7. A device, comprising:
a III-nitride epitaxial film grown on or above a used III-nitride substrate, wherein the epitaxial film is grown on or above a sacrificial layer grown on or above the substrate.
8. A method of fabricating a device, comprising:
growing an epitaxial film, comprising a III-nitride optoelectronic or electronic device structure, on or above a used III-nitride substrate, wherein the epitaxial film comprises an optoelectronic, electronic, or thermoelectric device structure and the device structure's performance is not degraded as compared to a device structure grown on a new or non-used III-nitride substrate.
9. A method for reusing gallium nitride (GaN) substrates, comprising:
performing an etch to remove one or more epitaxial layers from a bulk or free-standing GaN substrate without damaging the substrate, thereby allowing the substrate to be reused for further growth of additional epitaxial layers.
10. The method of claim 9 , wherein the etch is a wet etch.
11. The method of claim 10 , wherein the etch is a band-gap-selective photoelectrochemical (PEC) etch.
12. The method of claim 9 , wherein the etch is performed on a sacrificial etch layer between the epitaxial layers and the substrate.
13. The method of claim 9 , wherein the substrate is a polar, semipolar or nonpolar orientation of GaN.
14. The method of claim 9 , wherein the epitaxial layers are sub-mounted to a carrier substrate before the etch is performed.
15. The method of claim 9 , wherein the substrate is an intact and reusable substrate following the etch.
16. The method of claim 15 , wherein the substrate is prepared for reuse following the etch by planarization techniques, such as etching, lapping, polishing.
17. The method of claim 15 , wherein the substrate is prepared for reuse following the etch by regrowth techniques including metalorganic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE) or hydride vapor phase epitaxy (HVPE).
18. The method of claim 15 , wherein the additional epitaxial layers are grown on the substrate following the etch.
19. A device or substrate processed using the method of claim 9 .