Electrowetting display and method of manufacturing the same

1. An electrowetting display comprising:

a first substrate;

a second substrate facing the first substrate;

an electrowetting layer between the first substrate and the second substrate, the electrowetting layer including a first fluid and a second fluid, wherein the first fluid has electrical conductivity or a polarity;

a first electrode on the first substrate;

a second electrode configured to form an electric field in cooperation with the first electrode; and

a hydrophobic barrier layer between the first substrate and the electrowetting layer to cover the first electrode, wherein the hydrophobic barrier layer includes a first surface contacting the first electrode and a second surface having a hydrophobicity stronger than a hydrophobicity of the first surface, and wherein the second surface contacts the electrowetting layer.

2. The electrowetting display of claim 1 , wherein the hydrophobic barrier layer comprises:

a hydrophilic portion that includes the first surface and contacts the first electrode; and

a hydrophobic portion coupled to the hydrophilic portion, wherein the hydrophobic portion includes the second surface and contacts the electrowetting layer.

3. The electrowetting display of claim 2 , wherein the first surface faces the second surface, and wherein the hydrophobic portion has a thickness equal to or substantially equal to a predetermined depth from the second surface, and the hydrophilic portion has a thickness equal to or substantially equal to a difference between the thickness of the hydrophobic portion and a thickness of the hydrophobic barrier layer.

4. The electrowetting display of claim 2 , wherein the hydrophobic portion comprises an inorganic insulating material containing fluorine.

5. The electrowetting display of claim 4 , wherein the hydrophilic portion comprises at least one of silicon oxide or silicon nitride, and the hydrophobic portion comprises at least one of fluorinated silicon oxide or fluorinated silicon nitride.

6. The electrowetting display of claim 2 , further comprising a plurality of partition walls on the hydrophobic barrier layer, wherein the plurality of partition walls correspond to a periphery of a pixel area of the first substrate, and wherein the hydrophilic portion is disposed in an area of the hydrophobic barrier layer, which overlaps the partition walls when viewed in a plan view.

7. The electrowetting display of claim 6 , wherein the hydrophobic portion and the hydrophilic portion are disposed in an area of the hydrophobic barrier layer, which corresponds to the pixel area.

8. The electrowetting display of claim 2 , further comprising a plurality of partition walls on a periphery area of a pixel area of the first substrate, wherein the hydrophobic barrier layer is disposed in the pixel area between two partition walls adjacent to each other among the partition walls.

9. The electrowetting display of claim 8 , wherein the hydrophobic barrier layer is substantially spaced apart from the partition walls when viewed in a plan view.

10. The electrowetting display of claim 1 , wherein the hydrophobic barrier layer comprises:

a hydrophilic layer that includes the first surface and contacts the first electrode; and

a hydrophobic layer on the hydrophilic layer, the hydro-phobic layer including the second surface, wherein the hydrophobic layer contacts the electrowetting layer, and wherein the hydrophobic layer comprises at least one of fluorinated silicon oxide or fluorinated silicon nitride.

11. An electrowetting display comprising:

a first substrate and a second substrate facing the first substrate;

an electrowetting layer between the first substrate and the second substrate, the electrowetting layer including a first fluid and a second fluid;

a first electrode on the first substrate;

a second electrode on the second substrate and configured to form an electric field in cooperation with the first electrode; and

a barrier layer covering the first electrode, wherein

the barrier layer includes a first portion and a second portion,

the first portion contacts the first electrode and has a first hydrophobicity,

the second portion contacts the electrowetting layer and has a second hydrophobicity, and

the second hydrophobicity is greater than the first hydrophobicity.

12. The electrowetting display of claim 11 , wherein the second portion of the barrier layer comprises an inorganic insulating material containing fluorine.

13. The electrowetting display of claim 11 , wherein the first portion of the barrier layer comprises at least one of silicon oxide or silicon nitride, and the second portion of the barrier layer comprises at least one of fluorinated silicon oxide or fluorinated silicon nitride.

14. The electrowetting display of claim 11 , further comprising a plurality of partition walls on the barrier layer, wherein the plurality of partition walls correspond to a periphery of a pixel area of the first substrate, and wherein the first portion of the barrier layer is disposed in an area of the barrier layer that overlaps the partition walls when viewed in a plan view.

15. The electrowetting display of claim 14 , wherein the first portion and the second portion of the barrier layer are disposed in an area of the barrier layer that corresponds to the pixel area.

16. The electrowetting display of claim 11 , further comprising a plurality of partition walls on a periphery area of a pixel area of the first substrate, wherein the barrier layer is disposed in the pixel area between two partition walls adjacent to each other among the partition walls.

17. The electrowetting display of claim 16 , wherein the barrier layer is substantially spaced apart from the partition walls when viewed in a plan view.