Fabricating method of embedded package structure
A fabricating method of an embedded package structure includes following steps. First and second boards are combined to form an integrated panel. First and second circuit structures are respectively formed on the first and second boards that are then separated. An embedded element is electrically disposed on the first circuit structure. First and second conductive bumps are respectively formed on a conductive circuit substrate and the second circuit structure. First and second semi-cured films are provided; a laminating process is performed to laminate the first circuit structure on the first board, the first and second semi-cured films, the conductive circuit substrate, and the second circuit structure on the second board. The first and second semi-cured films encapsulate the embedded element. The first and second conductive bumps respectively pierce through the first and second semi-cured films and are electrically connected to the first circuit structure and the conductive circuit substrate, respectively.
1. A fabricating method of an embedded package structure, comprising:
combining a first board and a second board to form an integrated panel;
forming a first circuit structure on the first board and forming a second circuit structure on the second board;
separating the first board from the second board;
electrically disposing an embedded element on the first circuit structure;
forming a first conductive bump on a surface of a conductive circuit substrate, the surface of the conductive circuit substrate facing a side of the first circuit structure;
forming a second conductive bump on the second circuit structure; and
providing a first semi-cured film and a second semi-cured film and performing a laminating process to laminate the first circuit structure on the first board, the first semi-cured film, the conductive circuit substrate, the second semi-cured film, and the second circuit structure on the second board, wherein the first semi-cured film and the second semi-cured film encapsulate the embedded element, the first conductive bump pierces through the first semi-cured film and is electrically connected to the first circuit structure after the laminating process is performed, and the second conductive bump pierces through the second semi-cured film and is electrically connected to the conductive circuit substrate after the laminating process is performed.
2. The fabricating method of the embedded package structure as claimed in claim 1 , wherein the step of forming the first circuit structure comprises:
forming a first circuit layer on the first board;
forming a first dielectric layer to cover the first circuit layer;
patterning the first dielectric layer to expose a portion of the first circuit layer; and
forming a second circuit layer on the first dielectric layer and the portion of the first circuit layer.
3. The fabricating method of the embedded package structure as claimed in claim 1 , wherein the step of forming the second circuit structure comprises:
forming a third circuit layer on the second board;
forming a second dielectric layer to cover the third circuit layer;
patterning the second dielectric layer to expose a portion of the third circuit layer; and
forming a fourth circuit layer on the second dielectric layer and the portion of the second circuit layer.
4. The fabricating method of the embedded package structure as claimed in claim 1 , wherein the first board and the second board are bonded together by an isolation layer, and the step of separating the first board from the second board comprises:
cutting a portion of the first board and the second board where the isolation layer is bonded.
5. The fabricating method of the embedded package structure as claimed in claim 1 , further comprising removing the second board to expose at least one pad and a circuit layer of the second circuit structure after the laminating process is performed.
6. The fabricating method of the embedded package structure as claimed in claim 5 , wherein after the second board is removed, the fabricating method further comprises:
forming a second solder mask layer on the circuit layer and exposing the at least one pad; and
forming a second passivation layer on the at least one pad.
7. The fabricating method of the embedded package structure as claimed in claim 5 , wherein a method of removing the second board comprises peeling, etching, or chemical mechanical polishing.
8. The fabricating method of the embedded package structure as claimed in claim 1 , further comprising removing the first board to expose at least one pad and a circuit layer of the first circuit structure after the laminating process is performed.
9. The fabricating method of the embedded package structure as claimed in claim 8 , wherein after the first board is removed, the fabricating method further comprises:
forming a first solder mask layer on the circuit layer and exposing the at least one pad; and
forming a first passivation layer on the at least one pad.
10. The fabricating method of the embedded package structure as claimed in claim 8 , wherein a method of removing the first board comprises peeling, etching, or chemical mechanical polishing.
11. The fabricating method of the embedded package structure as claimed in claim 1 , wherein a method of forming the first conductive bump comprises coat printing, electroless plating, or chemical electroplating.
12. The fabricating method of the embedded package structure as claimed in claim 1 , wherein a method of forming the second conductive bump comprises coat printing, electroless plating, or chemical electroplating.