IP Library Granted Patent US 8,974,856
Granted Patent B2
US 8,974,856 · App. 12/786,940 · Granted Mar 10, 2015

Method for fabrication of ceramic dielectric films on copper foils

Inventors: Beihai Ma (Naperville, IL); Manoj Narayanan (Woodridge, IL); Stephen E. Dorris (LaGrange Park, IL); Uthamalingam Balachandran (Willowbrook, IL)
Assignee: UChicago Argonne, LLC
C23C26/00C04B35/491C04B35/624C23C18/1208C23C18/1225C23C18/1241C23C18/1254C23C18/1283H01G4/1218H01G4/1245C04B2235/3227C04B2235/3232C04B2235/3244C04B2235/3296C04B2235/441C04B2235/443C04B2235/449C04B2235/6562C04B2235/6565C04B2235/6584C04B2235/768
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Quick Facts
Patent No.
US 8,974,856
App. No.
12/786,940
Granted
Mar 10, 2015
Kind
B2
Abstract

The present invention provides a method for fabricating a ceramic film on a copper foil. The method comprises applying a layer of a sol-gel composition onto a copper foil. The sol-gel composition comprises a precursor of a ceramic material suspended in 2-methoxyethanol. The layer of sol-gel is then dried at a temperature up to about 250° C. The dried layer is then pyrolyzed at a temperature in the range of about 300 to about 450° C. to form a ceramic film from the ceramic precursor. The ceramic film is then crystallized at a temperature in the range of about 600 to about 750° C. The drying, pyrolyzing and crystallizing are performed under a flowing stream of an inert gas. In some embodiments an additional layer of the sol-gel composition is applied onto the ceramic film and the drying, pyrolyzing and crystallizing steps are repeated for the additional layer to build up a thicker ceramic layer on the copper foil. The process can be repeated one or more times if desired.

Claims (33)

1. A method for fabricating a ceramic film on a copper substrate, the method comprising the steps of:

(a) applying onto a copper substrate a layer of a sol-gel composition comprising a precursor of a ceramic material in 2-methoxyethanol;

(b) drying the layer of step (a) at a temperature up to about 250° C. in air;

(c) pyrolyzing the dried layer from step (b) at a temperature in the range of about 300 to about 450° C. under a flowing stream of an inert gas to form a ceramic film from the ceramic precursor;

(d) optionally applying one or two additional layers of the sol-gel composition onto the ceramic film from step (c) and repeating steps (b), and (c) for each additional layer, to build up a thicker ceramic film on the copper substrate;

(e) crystallizing the ceramic film at a temperature in the range of about 600 to about 750° C. under a flowing stream of an inert gas; and

(f) optionally applying one or more additional layers of the sol-gel composition onto the crystallized ceramic film from step (e), and repeating (b), (c), (d), and (e) for each additional layer;

wherein the flowing stream of inert gas in step (e) maintains a partial pressure of oxygen (pO 2 ) of about 10 −6 atm to 10 −8 atm; and wherein the ceramic material is a lead-lanthanum-zirconium-titanium oxide material and the ceramic precursor comprises a lead compound, a lanthanum compound, a zirconium compound and a titanium compound.

2. The method of claim 1 wherein the applying a layer of a sol-gel composition comprises spin coating the sol-gel composition onto the copper substrate.

3. The method of claim 1 wherein the ceramic precursor comprises a lead salt, a titanium alkoxide, a zirconium alkoxide, and a lanthanum salt.

4. The method of claim 3 wherein the lead salt comprises lead acetate.

5. The method of claim 3 wherein the titanium alkoxide comprises titanium isopropoxide.

6. The method of claim 3 wherein the zirconium alkoxide comprises zirconium propoxide.

7. The method of claim 3 wherein the lanthanum salt comprises lanthanum nitrate.

8. The method of claim 1 wherein the copper substrate comprises a copper foil having a thickness in the range of about 0.01 mm to about 1 mm.

9. The method of claim 8 wherein the copper foil has a thickness in the range of about 0.2 to about 0.5 mm.

10. The method of claim 1 wherein the copper substrate has a polished surface with a RMS surface roughness of not more than about 10 nm.

11. The method of claim 1 wherein the drying is performed at about 250° C.

12. The method of claim 1 wherein the pyrolyzing is performed at a temperature of about 450° C.

13. The method of claim 1 wherein the crystallizing is performed at a temperature of about 650 to about 700° C.

14. The method of claim 1 wherein the inert gas comprises nitrogen.

15. The method of claim 1 comprising applying one or two additional layers of the sol-gel composition onto the ceramic film from step (c) and repeating steps (b), and (c) for each additional layer, to build up a thicker ceramic film on the copper substrate, prior to crystallizing the ceramic film.

16. The method of claim 15 comprising applying one or more additional layers of the sol-gel composition onto the crystallized ceramic film from step (e), and repeating (b), (c), (d), and (e) for each additional layer.

17. A method for fabricating a lead-lanthanum-zirconium-titanium (PLZT) ceramic film on a copper substrate, the method comprising the steps of:

(a) applying onto the copper substrate a layer of a sol-gel composition containing a ceramic precursor comprising a lead compound, a lanthanum compound, a zirconium compound, and a titanium compound in 2-methoxyethanol;

(b) drying the layer of step (a) at a temperature up to about 250° C.;

(c) pyrolyzing the dried layer from step (b) at a temperature in the range of about 300 to about 450° C. under a flowing stream of an inert gas to form a PLZT ceramic film from the ceramic precursor;

(d) applying one or two additional layers of the sol-gel composition onto the ceramic film from step (c) and repeating steps (b), and (c) for each additional layer, to build up a thicker ceramic film on the copper substrate;

(e) crystallizing the ceramic film from step (c) at a temperature in the range of about 600 to about 750° C. under a flowing stream of an inert gas; and

(f) applying one or more additional layers of the sol-gel composition onto the crystallized ceramic film from step (e), and repeating (b), (c), (d), and (e) for each additional layer;

wherein the flowing stream of inert gas in step (e) maintains a partial pressure of oxygen (pO 2 ) of about 10 −6 atm to 10 −8 atm.

18. The method of claim 17 wherein the pyrolyzing is performed at a temperature of about 450° C.

19. The method of claim 17 wherein the crystallizing is performed at a temperature of about 650 to about 700° C.

Assignments (2)
CONFIRMATORY LICENSE Recorded Aug 2, 2010
From: UCHICAGO ARGONNE, LLC
To: ENERGY, UNITED STATES DEPARTMENT OF
Reel/Frame 024777/0933 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 1, 2010
From: MA, BEIHAI; NARAYANAN, MANOJ; DORRIS, STEPHEN E.
To: UCHICAGO ARGONNE, LLC
Reel/Frame 024466/0493 →
Continuity (2)
Provisional Application 61183148 · Jun 2, 2009
Related Publication 20100302706A1 · Dec 2, 2010