IP Library Granted Patent US 9,082,552
Granted Patent B2
US 9,082,552 · App. 13/652,717 · Granted Jul 14, 2015

Method of manufacturing capacitor

Inventors: Yoshihiko Imanaka (Kawasaki, JP); Hideyuki Amada (Kawasaki, JP); Fumiaki Kumasaka (Kawasaki, JP)
Assignee: FUJITSU LIMITED
H01G4/1227H01G13/00H01L23/49822H01L23/49833H01L23/50H01L2224/16225H01L2224/16227Y10T29/435
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,082,552
App. No.
13/652,717
Granted
Jul 14, 2015
Kind
B2
Abstract

A method of manufacturing a capacitor includes forming, above a first metal foil, a first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle, forming, in the first dielectric film, a first via conductor connected to the first metal foil and a second via conductor connected to the first metal foil, forming, above the first dielectric film, a first electrode pattern connected to the first via conductor, and patterning the first metal foil to form a second electrode pattern connected to the second via conductor.

Claims (52)

1. A method of manufacturing a capacitor comprising:

forming, above a first metal foil, a first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle;

forming, in the first dielectric film, a first via conductor connected to the first metal foil and a second via conductor connected to the first metal foil;

forming, above the first dielectric film, a first electrode pattern connected to the first via conductor; and

patterning the first metal foil to form a second electrode pattern connected to the second via conductor, wherein

forming the first electrode pattern includes:

forming, above a second metal foil, a second dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the second metal foil from a nozzle;

forming, in the second dielectric film, a third via conductor connected to the second metal foil and a fourth via conductor connected to the second metal foil;

forming, above the second dielectric film, the first electrode pattern connected to the third via conductor; and

jointing the first dielectric film and the second dielectric film with the first via conductor and the first electrode pattern connected to each other and with the second via conductor and the fourth via conductor connected to each other.

2. The method of manufacturing a capacitor according to claim 1 , further comprising, after forming the first electrode pattern,

forming a third electrode pattern connected to the fourth via conductor.

3. The method of manufacturing a capacitor according to claim 2 , wherein

forming the third electrode pattern includes:

removing the second metal foil; and

forming the third electrode pattern above the second dielectric film.

4. The method of manufacturing a capacitor according to claim 2 , wherein

in forming the third electrode pattern, the second metal foil is patterned to form the third electrode pattern.

5. The method of manufacturing a capacitor according to claim 1 , wherein

the first metal foil, the first via conductor, the second via conductor and the first electrode pattern are formed of copper.

6. A method of manufacturing a capacitor comprising:

forming a plurality of first substrates each including a first dielectric film with a first via conductor and a second via conductor buried in and a first electrode pattern connected to the first via conductor by

forming, above a first metal foil, the first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle;

forming, in the first dielectric film, the first via conductor connected to the first metal foil and the second via conductor connected to the first metal foil;

forming, above the first dielectric film, the first electrode pattern connected to the first via conductor; and

removing the first metal foil;

forming a plurality of second substrates each including a second dielectric film with a third via conductor and a fourth via conductor buried in and a second electrode pattern connected to the third via conductor by

forming, above a second metal foil, the second dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle;

forming, in the second dielectric film, the third via conductor connected to the second metal foil and the fourth via conductor connected to the second metal foil;

forming, above the second dielectric film, the second electrode pattern connected to the third via conductor; and

removing the second metal foil; and

repeatedly stacking the first substrate and the second substrate with the first electrode pattern connected alternately to the first via conductor and the fourth via conductor and with the second electrode pattern alternately connected to the third via conductor and the second via conductor.

7. The method of manufacturing a capacitor according to claim 6 , further comprising:

making thermal processing at a temperature lower than melting points of the materials of the first via conductor, second via conductor, third via conductor, fourth via conductor, the first electrode pattern and the second electrode pattern to anneal the first dielectric films and the second dielectric films and integrate the plural first substrates and the plural second substrate stacked.

8. The method of manufacturing a capacitor according to claim 6 , wherein

the first metal foil, the second metal foil, the first via conductor, the second via conductor, the third via conductor, the fourth via conductor, the first electrode pattern and the second electrode pattern are formed of copper.

9. The method of manufacturing a capacitor according to claim 6 , wherein

in forming the first dielectric film, the first dielectric film is formed by jetting to the first metal foil an aerosol containing material particles having surfaces reformed in an amorphous layer and containing no liquid, and

in forming the second dielectric film, the second dielectric film is formed by jetting to the second metal foil an aerosol containing material particles having surfaces reformed in an amorphous layer and containing no liquid.

10. A method of manufacturing a capacitor comprising:

forming, above a first metal foil, a first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle;

forming, in the first dielectric film, a first via conductor connected to the first metal foil and a second via conductor connected to the first metal foil;

forming, above the first dielectric film, a first electrode pattern connected to the first via conductor; and

patterning the first metal foil to form a second electrode pattern connected to the second via conductor, wherein

the method further comprising

making a thermal processing to anneal the dielectric film at a temperature lower than melting points of the materials of the first metal foils, the first via conductor, the second via conductor and the first electrode pattern.

11. A method of manufacturing a capacitor comprising:

forming, above a first metal foil, a first dielectric film of a ceramic material containing barium oxide by blowing dry ceramic particles to the first metal foil from a nozzle;

forming, in the first dielectric film, a first via conductor connected to the first metal foil and a second via conductor connected to the first metal foil;

forming, above the first dielectric film, a first electrode pattern connected to the first via conductor; and

patterning the first metal foil to form a second electrode pattern connected to the second via conductor, wherein

in forming the first dielectric film, the first dielectric film is formed by jetting to the first metal foil an aerosol containing material particles having surfaces reformed in an amorphous layer and containing no liquid.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2025
From: FUJITSU LIMITED
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 073964/0516 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 27, 2024
From: FUJITSU LIMITED
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 069454/0333 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2012
From: IMANAKA, YOSHIHIKO; AMADA, HIDEYUKI; KUMASAKA, FUMIAKI
To: FUJITSU LIMITED
Reel/Frame 029181/0058 →
Priority Claims (1)
JP 2010-095017 · Apr 16, 2010 · national
Continuity (2)
Continuation PCTJP2011059159 · Apr 13, 2011
Related Publication 20130038981A1 · Feb 14, 2013