Photosensitive siloxane resin composition
View Patent ↗[Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that. [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
1. A positive working photosensitive siloxane resin composition comprising
a siloxane resin having silanol groups or alkoxysilyl groups, wherein said siloxane resin comprises at least one structure selected from the group consisting of a silicone skeleton, a silsesquioxane skeleton and a silica skeleton, wherein the silicone skeleton comprises 10 mole % or less of the total siloxane resin,
a crown ether, selected from the group consisting of 21-crown-7-ether, 18-crown-6-ether, 15-crown-5-ether, 12-crown-4-ether, dibenzo-21-crown-7-ether, dibenzo-18-crown-6-ether, dibenzo-15-crown-5-ether, dibenzo-12-crown-4-ether, dicyclohexyl-21-crown-7-ether, dicyclohexyl-18-crown-6-ether, dicyclo-hexyl-15-crown-5-ether, and dicyclohexyl-12-crown-4-ether.
a photosensitive additive chosen from a diazonaphthoquinone derivative where a phenolic hydroxyl-containing compound is combined via an ester bond with a naphthoquinonediazidesulfonic acid and,
an organic solvent.
2. The photosensitive siloxane resin composition according to claim 1 , wherein said siloxane resin has a silsesquioxane structure.
3. The photosensitive siloxane resin composition according to claim 1 , wherein said siloxane resin has a weight average molecular weight of 400 to 5000.
4. A pattern formation method comprising the steps of:
coating a substrate with the photosensitive siloxane resin composition according to claim 1 , to form a coating;
subjecting said coating to imagewise exposure;
treating the exposed coating with an alkali aqueous solution; and then
curing the treated coating at 150 to 450° C. in air or in an inert gas atmosphere.
5. A siliceous film produced according to the method of claim 4 .
6. The photosensitive siloxane resin composition according to claim 1 , where the crown ether is selected from the group consisting of 18-crown-6-ether, and 15-crown-5-ether.
7. The photosensitive siloxane resin composition according to claim 1 , where the siloxane resin having silanol groups or alkoxysilyl groups, is obtained by hydrolysis of one or more alkoxysilane compounds represented by formula (A);
(R 1 ) a Si(OR 2 ) 4-a (A)
where R 1 is a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 6 carbon atoms, a substituted or unsubstituted aralkyl group having 15 or less carbon atoms and having no hydrogen atom connecting to the α-position carbon atom, a substituted or unsubstituted aryl group having 6 to 15 carbon atoms, or a substituted or unsubstituted alkenyl group having 1 to 6 carbon atoms, R 2 is a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms; and a is an integer of 0 to 3.
8. The photosensitive siloxane resin composition according to claim 1 , where the siloxane resin having silanol groups or alkoxysilyl groups, is obtained by hydrolysis of one or more halosilane compounds represented by the following formula (B);
(R 1 ) a SiX 4-a (B),
where R 1 is a hydrogen atom, a substituted or unsubstituted alkyl group having 1to 6 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 6 carbon atoms, a substituted or unsubstituted aralkyl group having 15 or less carbon atoms and having no hydrogen atom connecting to the α-position carbon atom, a substituted or unsubstituted aryl group having 6 to 15 carbon atoms, or a substituted or unsubstituted alkenyl group having 1 to 6 carbon atoms, X, is a halogen atom, and a is an integer of 0 to 3.
9. The photosensitive siloxane resin composition according to claim 1 , where the siloxane resin having silanol groups or alkoxysilyl groups, is obtained by hydrolysis of a combination of compound (A) and (B).
10. The photosensitive siloxane resin composition according to claim 1 , where the naphthoquinonediazidesulfonic acid is 4-napthoquinonediazidesulfonic acid or 5-napthoquinonediazidesulfonic acid.
11. The photosensitive siloxane resin composition according to claim 1 , where the phenolic hydroxyl compounds is selected from the group consisting of the following compounds;