GaN-containing semiconductor structure
A method for forming a GaN-containing semiconductor structure is provided. The method comprises a substrate is provided, a nucleation layer is formed above the substrate, a diffusion blocking layer is formed above the nucleation layer, a strain relief layer is formed above the diffusion blocking layer, and a semiconductor layer is formed above the strain relief layer, in which the diffusion blocking layer is deposited on the nucleation layer such that the diffusion blocking layer can prevent the impurities out-diffusion from the substrate.
1. A method for forming a GaN-containing semiconductor structure by using metal-organic chemical vapor deposition (MOCVD), comprising:
providing a substrate;
providing a nucleation layer on the substrate by using metal-organic chemical vapor deposition (MOCVD), wherein a forming temperature of the nucleation layer is from 500° C. to 800° C.;
providing a diffusion blocking layer on the nucleation layer by using metal-organic chemical vapor deposition (MOCVD), wherein the forming temperature of the diffusion blocking layer is from 950° C. to 1200° C.;
providing a strain relief layer on the diffusion blocking layer by using metal-organic chemical vapor deposition (MOCVD), wherein the forming temperature of the strain relief layer is from 450° C. to 600° C.; and
providing a semiconductor layer on the strain relief layer by using metal-organic chemical vapor deposition (MOCVD), wherein the forming temperature of the semiconductor layer is from 950° C. to 1200° C.
2. A GaN-containing semiconductor structure formed by using metal-organic chemical vapor deposition (MOCVD), comprising:
a substrate;
a nucleation layer on the substrate, wherein the nucleation layer is AlN layer;
a diffusion blocking layer on the nucleation layer, wherein the diffusion blocking layer is selected from the group consisting of a single AlN layer, the single AlN layer with a single AlGaN layer, the single AlN layer with multiple AlGaN layers, wherein the forming temperature of the diffusion blocking layer is from 950° C. to 1200° C.;
a strain relief layer on the diffusion blocking layer, wherein the strain relief layer is GaN, and a thickness of the strain relief layer is from 30 nm to 100 nm, the forming temperature of the strain relief layer is from 450° C. to 600° C.; and
a semiconductor layer on the strain relief layer, wherein the forming temperature of the semiconductor layer is from 950° C. to 1200° C.