Method for manufacturing organic EL display device

1. A method for manufacturing an organic EL display device including a first organic EL element and a second organic EL element on a substrate, wherein the first organic EL element includes a first organic compound layer between a first electrode and a second electrode and the second organic EL element includes a second organic compound layer between a third electrode and the second electrode, the method comprising:

forming the first organic compound layer over the substrate on which the first electrode and the third electrode are disposed;

selectively forming a release layer on the first organic compound layer on the first electrode;

removing the first organic compound layer that is not covered by the release layer;

forming the second organic compound layer by vapor deposition over the substrate on which the release layer, the first organic compound layer, and the third electrode remain;

removing a portion of the second organic compound layer, wherein the portion of the second organic compound layer overlies the release layer, by dissolving the release layer; and

forming the second electrode on the remaining first organic compound layer and the remaining second organic compound layer.

2. The method according to claim 1 , wherein a total thickness of the first organic compound layer and the release layer is larger than a thickness of the second organic compound layer after the forming of the second organic compound layer.

3. The method according to claim 1 , wherein the organic EL display device includes a third organic EL element on the substrate, wherein the third organic EL element includes a third organic compound layer between a fourth electrode and the second electrode, the method further comprising

selectively forming a second release layer on the remaining first organic compound layer formed on the first electrode and the remaining second organic compound layer formed on the third electrode;

removing the remaining second organic compound layer that is not covered by the second release layer;

forming the third organic compound layer by vapor deposition over the substrate, on which the second release layer is left; and

removing a portion of the third organic compound layer, wherein the portion of the third organic compound layer overlies the second release layer, by dissolving the second release layer, between the removing of the portion of the second organic compound layer, which overlies the release layer, and the forming of the second electrode,

wherein in the forming of the second electrode, the second electrode is formed on the remaining first organic compound layer, the further remaining second organic compound layer, and the remaining third organic compound layer.

4. The method according to claim 3 , wherein said selectively forming the second release layer and said removing the remaining second organic compound layer that is not covered by the second release layer are performed by

forming the second release layer over an entire surface of the substrate on which the second organic compound layer is formed,

selectively forming a photoresist layer above the first organic compound layer on the first electrode and the second organic compound layer on the third electrode by a photolithography method, and

removing the second release layer and the remaining second organic compound layer together that are not covered by the photoresist layer.

5. The method according to claim 4 , further comprising

forming a second protective layer on the second release layer before selectively forming the photoresist layer; and

removing the second protective layer that is not covered by the photoresist layer after selectively forming the photoresist layer above the remaining first organic compound layer on the first electrode and the remaining second organic compound layer on the third electrode and before removing the second release layer and the remaining second organic compound layer that are not covered by the photoresist layer.

6. The method according to claim 5 , wherein the removing of the second release layer and the second organic compound layer is performed using an etching gas with which the second protective layer is etched at a lower rate than the second release layer and the second organic compound layer.

7. The method according to claim 5 , wherein the removing of the second protective layer and the removing of the second release layer and the second organic compound layer are continuously performed.

8. The method according to claim 1 , wherein said selectively forming the release layer and said removing the first organic compound layer that is not covered by the release layer are performed by

forming the release layer over the substrate on which the first organic compound layer is formed,

selectively forming a photoresist layer above the first organic compound layer on the first electrode by a photolithography method, and

removing the release layer and the first organic compound layer together that are not covered by the photoresist layer.

9. The method according to claim 8 , further comprising:

forming a protective layer on the release layer before selectively forming the photoresist layer; and

removing the protective layer that is not covered by the photoresist layer after selectively forming the photoresist layer and before removing the release layer and the first organic compound layer together that are not covered by the photoresist layer.

10. The method according to claim 9 , wherein the removing of the release layer and the first organic compound layer is performed by dry etching using an etching gas with which the protective layer is etched at a lower rate than the release layer and the first organic compound layer.

11. The method according to claim 9 , wherein the removing of the protective layer and the removing of the release layer and the first organic compound layer are continuously performed.