Phase change memory cell with improved phase change material
View Patent ↗A phase change memory cell. The phase change memory cell includes a substrate and a phase change material. The phase change material is deposited on the substrate for performing a phase change function in the phase change memory cell. The phase change material is an alloy having a mass density change of less than three percent during a transition between an amorphous phase and a crystalline phase.
1. A phase change memory cell, comprising:
a substrate; and
a phase change material deposited on the substrate for performing a phase change function in the phase change memory cell, the phase change material being an alloy having a mass density change of less than three percent during a transition between an amorphous phase and a crystalline phase, wherein the phase change material is formed from a mixture consisting of Gallium and Antimony and at least one of Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold, wherein the phase change material is formed from the mixture of Gallium and Antimony, the mixture comprising three atomic % parts Gallium to seven atomic % parts Antimony.
2. The phase change memory cell of claim 1 , wherein the phase change material comprises
at least two of Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold added to the mixture of Gallium and Antimony.
3. The phase change memory cell of claim 2 , wherein the mixture consists of Gallium, Antimony, and at least two of Indium, Silver, and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.
4. The phase change memory cell of claim 1 , wherein the phase change material has an electrical contrast above an electrical contrast threshold and a switching time below a switching time threshold.
5. The phase change memory cell of claim 1 , wherein the mixture consists of Gallium, Antimony, and at least one of Silver and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.
6. A method for forming a phase change memory cell, comprising:
providing a substrate; and
depositing a phase change material on the substrate for performing a phase change function in the phase change memory cell, the phase change material being an alloy having a mass density change of less than three percent during a transition between an amorphous phase and a crystalline phase, wherein the phase change material is formed from a mixture consisting of Gallium and Antimony and at least one of Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold, wherein the phase change material is formed from the mixture of Gallium and Antimony, the mixture comprising three atomic % parts Gallium to seven atomic % parts Antimony.
7. The method of claim 6 , wherein said depositing step comprises:
adding at least two of Silicon, Germanium (Ge), Arsenic (As), Selenium, Indium, Tin, Bismuth, Silver, and Gold to the mixture; and
depositing the mixture on the substrate.
8. The method of claim 7 , wherein the mixture consists of Gallium, Antimony, and at least two of Indium, Silver, and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.
9. The method of claim 6 , wherein the phase change material has an electrical contrast above an electrical contrast threshold and a switching time below a switching time threshold.
10. The method of claim 6 , wherein the mixture consists of Gallium, Antimony, and at least one of Silver and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.
11. A method for forming a phase change memory cell, comprising:
providing a substrate for the phase change material; and
depositing a mixture consisting of Gallium, Antimony and at least one of Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold on the substrate as a phase change material for a phase change portion of the phase change memory cell, the phase change material having a mass density change of less than 3 percent during a transition between an amorphous phase and a crystalline phase, wherein the phase change material is formed from the mixture of Gallium and Antimony, the mixture comprising three atomic % parts Gallium to seven atomic % parts Antimony.
12. The method of claim 11 , wherein said depositing step comprises:
adding at least two of Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, Gold to the mixture; and
depositing the mixture on the substrate.
13. The method of claim 12 , wherein the mixture consists of Gallium, Antimony, and at least two of Indium, Silver, and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.
14. The method of claim 11 , wherein the phase change material has an electrical contrast above an electrical contrast threshold and a switching time below a switching time threshold.
15. The method of claim 11 , wherein the mixture consists of Gallium, Antimony, and at least one of Silver and Gold from among Silicon, Germanium, Arsenic, Selenium, Indium, Tin, Bismuth, Silver, and Gold.