Semi-continuous vapor deposition process for the manufacture of coated particles

1. A reactor configured for performing a single two-reagent atomic layer or molecular layer vapor phase deposition cycle on a powder, comprising:

a powder reservoir;

a first reactive precursor reservoir positioned below said powder reservoir;

a second reactive precursor reservoir positioned below said first reactive precursor reservoir;

a reactive precursor dosing system;

a first constricted flow path flanged valve assembly operatively interposed between said powder reservoir and said first reactive precursor reservoir comprising a first valve, at least one valved inlet port in fluid communication with said first reactive precursor reservoir and said reactive precursor dosing system, at least one valved outlet port in fluid communication with said powder reservoir, said first reactive precursor reservoir or both, wherein said valved outlet port is in fluid communication with a vacuum pump for removing fluids from said powder reservoir and/or said first reactive precursor reservoir and/or producing a vacuum therein, wherein said first valve operable between an open and a closed position such that said powder reservoir is isolated from said first reactive precursor reservoir when said first valve is in the closed position but when said first valve is in the open position said first flanged valve assembly is computer controlled and is configured to allow simultaneous transfer of a powder contained within said powder reservoir into said first reactive precursor reservoir and a first reactive precursor contained within said first reactive precursor reservoir into said powder reservoir while allowing instant contact between the powder and the first reactive precursor to produce a first coated powder;

a second constricted flow path flanged valve assembly operatively interposed between said first reactive precursor reservoir and said second reactive precursor reservoir comprising a second valve, at least one valved inlet port in fluid communication with said second reactive precursor reservoir and said reactive precursor dosing system, at least one valved outlet port in fluid communication with said first reactive precursor reservoir, said second reactive precursor reservoir or both, wherein said valved outlet port is in fluid communication with a vacuum pump for removing fluids from said first reactive precursor reservoir and/or said second reactive precursor reservoir and/or producing a vacuum therein, wherein said second valve operable between an open and a closed position such that said first reactive precursor reservoir is isolated from said second reactive precursor reservoir when said second valve is in the closed position but when the said second valve is in the open position, said second flanged valve assembly is computer controlled and is configured to allow simultaneous transfer of a powder contained within said first reactive precursor reservoir into said second reactive precursor reservoir and a second reactive precursor contained within said second reactive precursor reservoir into said first reactive precursor reservoir while allowing instant contact between the powder and a second reactive precursor to produce a second coated powder,

wherein the powder reservoir comprises a conical section having gradually diminished cross-sections toward said first constricted flow path flanged valve assembly, wherein the first reactive precursor reservoir comprises a conical section having gradually diminished cross-sections toward said second constricted flow path flanged valve assembly, and wherein the reactor is configured to perform said atomic layer or molecular layer deposition cycle to deposit a coating of about 5 Angstroms or less on said powder having a particle size of 100 microns or less.

2. The reactor of claim 1 , further comprising at least one of (a) a powder inlet for charging powder to the powder reservoir; (b) at least one analytical device for detecting the presence and/or concentration of at least one reactive precursor, sweep gas, purge gases and/or reaction product, and/or to measure the presence and/or extent of coatings on the particle surfaces and (c) at least one heating and/or cooling device to provide temperature control to the powder reservoir, the reactive precursor reservoir, or both.

3. The reactor of claim 1 further comprising a first coated powder reservoir located between said first reactive precursor reservoir positioned below said second constricted flow path flanged valve assembly, and an additional constricted flow path flanged valve assembly operatively interposed between said first coated powder reservoir and said second reactive precursor reservoir, said additional constricted flow path flanged valve assembly comprising an additional valve and at least one valved outlet port in fluid communication with said vacuum pump, wherein said first coated powder reservoir is configured to receive said first coated powder from said first reactive precursor reservoir and to remove said first reactive precursor from said first coated powder, and wherein the first coated powder reservoir comprises a conical section having gradually diminished cross-sections toward said additional constricted flow path flanged valve assembly.

4. The reactor of claim 1 further comprising a dense-phase pneumatic conveyor operatively interposed between said second reactive precursor reservoir and a powder inlet for charging powder to said powder reservoir to conduct further atomic layer or molecular layer deposition reaction cycles on said powder having a particle size of 100 microns or less to deposit a coating of 100 nm or less.

5. The reactor of claim 1 configured for a single complex three-reagent or optionally a four-reagent atomic layer or molecular layer vapor phase deposition cycle on a powder further comprising:

a third reactive precursor reservoir positioned below said second reactive precursor reservoir;

a third constricted flow path flanged valve assembly operatively interposed between said second reactive precursor reservoir and said third reactive precursor reservoir comprising a third valve, at least one valved inlet port in fluid communication with said third reactive precursor reservoir and said reactive precursor dosing system, at least one valved outlet port in fluid communication with said second reactive precursor reservoir, said third reactive precursor reservoir or both, wherein said valved outlet port is in fluid communication with a vacuum pump for removing fluids from said second reactive precursor reservoir and/or said third reactive precursor reservoir and/or producing a vacuum therein, wherein said third valve is interposed between said second reactive precursor reservoir and said third reactive precursor reservoir, said third valve operable between an open and a closed position such that said second reactive precursor reservoir is isolated from said third reactive precursor reservoir when said third valve is in the closed position but when said first valve is in the open position, said third flanged valve assembly is computer controlled and is configured to allow simultaneous transfer of a powder contained within said second reactive precursor reservoir into said third reactive precursor reservoir and a third reactive precursor contained within said third reactive precursor reservoir into said second reactive precursor reservoir while allowing instant contact between the powder and the third reactive precursor to produce a third coated powder;

optionally, a fourth reactive precursor reservoir positioned below said third reactive precursor reservoir with a fourth constricted flow path flanged valve assembly operatively interposed between said third reactive precursor reservoir and said fourth reactive precursor reservoir comprising a fourth valve, at least one valved inlet port in fluid communication with said fourth reactive precursor reservoir and said reactive precursor dosing system, at least one valved outlet port in fluid communication with said third reactive precursor reservoir, said fourth reactive precursor reservoir or both, wherein said valved outlet port is in fluid communication with a vacuum pump for removing fluids from said third reactive precursor reservoir and/or said fourth reactive precursor reservoir and/or producing a vacuum therein, wherein said fourth valve is interposed between said third reactive precursor reservoir and said fourth reactive precursor reservoir, said fourth valve operable between an open and a closed position such that said third reactive precursor reservoir is isolated from said fourth reactive precursor reservoir when said fourth valve is in the closed position but when said fourth valve is in the open position, said fourth flanged valve assembly is computer controlled and is configured to allow simultaneous transfer of a powder contained within said third reactive precursor reservoir into said fourth reactive precursor reservoir and a fourth reactive precursor contained within said fourth reactive precursor reservoir into said third reactive precursor reservoir while allowing instant contact between the powder and the fourth reactive precursor to produce a fourth coated powder;

wherein the third reactive precursor reservoir comprises a conical section having gradually diminished cross-sections toward said third constricted flow path flanged valve assembly, wherein the optional fourth reactive precursor reservoir comprises a conical section having gradually diminished cross-sections toward said optional fourth constricted flow path flanged valve assembly, and wherein the reactor is configured for performing said complex atomic layer or molecular layer deposition cycle to deposit a coating of about 5 Angstroms or less on said powder having a particle size of 100 microns or less.

6. A semi-continuous reactor assembly configured to carry out a sequence of N two-reagent atomic layer or molecular layer vapor phase deposition cycles on a powder, for up to N=200 to deposit a coating of about 100 nm or less on said powder having a particle size of 100 microns or less, comprising:

a first Reactor of claim 1 ;

a second Reactor of claim 1 ;

a first gravitational or dense-phase pneumatic conveyor operatively interposed between said first Reactor of claim 1 and second Reactor of claim 1 for charging powder into said second reactor of claim 1 ;

a third through Nth Reactor of claim 1 ;

a second through (N−1)th gravitational or dense-phase pneumatic conveyor operatively interposed between the nth Reactor of claim 1 and the (n+1)th Reactor of claim 1 , where 2≦n≦(N−1);

wherein a first reactive precursor is supplied to the first reactive precursor reservoirs of some or all of the N Reactors of claim 1 through a common feed system, wherein a second reactive precursor is supplied to the second reactive precursor reservoirs of some or all of the N Reactors of claim 1 through a common feed system, and wherein all N Reactors of claim 1 are configured for simultaneous coating operations.

7. A semi-continuous reactor assembly configured to carry out a sequence of N three-reagent or optionally four-reagent atomic layer or molecular layer vapor phase deposition cycles on a powder, for up to N=200 to deposit a coating of about 100 nm or less on said powder having a particle size of 100 microns or less, comprising:

a first Reactor of claim 5 ;

a second Reactor of claim 5 ;

a first gravitational or dense-phase pneumatic conveyor operatively interposed between said first Reactor of claim 5 and second Reactor of claim 5 for charging powder into said second reactor of claim 5 ;

a third through Nth Reactor of claim 5 ;

a second through (N−1)th gravitational or dense-phase pneumatic conveyor operatively interposed between the nth Reactor of claim 5 and the (n+1)th Reactor of claim 5 , where 2≦n≦(N−1);

wherein a first reactive precursor is supplied to the first reactive precursor reservoirs of some or all of the N Reactors of claim 5 through a common feed system, wherein a second reactive precursor is supplied to the second reactive precursor reservoirs of some or all of the N Reactors of claim 5 through a common feed system, wherein a third reactive precursor is supplied to the third reactive precursor reservoirs of some or all of the N Reactors of claim 5 through a common feed system, optionally wherein a fourth reactive precursor is supplied to the fourth reactive precursor reservoirs of some or all of the N Reactors of claim 5 through a common feed system, and wherein all N Reactors of claim 5 are configured for simultaneous operation.