IP Library Granted Patent US 9,324,733
Granted Patent B2
US 9,324,733 · App. 14/220,910 · Granted Apr 26, 2016

Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics

Inventors: John A. Rogers (Champaign, IL); Matthew Meitl (Durham, NC); Yugang Sun (Naperville, IL); Heung Cho Ko (Gwangju, KR); Andrew Carlson (Urbana, IL); Won Mook Choi (Gyeonggi-do, KR); Mark Stoykovich (Dover, NH); Hanqing Jiang (Chandler, AZ); Yonggang Huang (Glencoe, IL); Ralph G. Nuzzo (Champaign, IL); Zhengtao Zhu (Rapid City, SD); Etienne Menard (Durham, NC); Dahl-Young Khang (Seoul, KR)
Assignee: The Board of Trustees of the University of Illinois
H01L27/12H01L21/02422H01L21/02628H01L21/8258H01L29/0657H05K1/0283H01L2924/12041H01L2924/13091H05K3/20H05K2201/0133H05K2201/09045H05K2203/0271
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Quick Facts
Patent No.
US 9,324,733
App. No.
14/220,910
Granted
Apr 26, 2016
Kind
B2
Abstract

In an aspect, the present invention provides stretchable, and optionally printable, components such as semiconductors and electronic circuits capable of providing good performance when stretched, compressed, flexed or otherwise deformed, and related methods of making or tuning such stretchable components. Stretchable semiconductors and electronic circuits preferred for some applications are flexible, in addition to being stretchable, and thus are capable of significant elongation, flexing, bending or other deformation along one or more axes. Further, stretchable semiconductors and electronic circuits of the present invention are adapted to a wide range of device configurations to provide fully flexible electronic and optoelectronic devices.

Claims (84)

1. A multilayer device comprising:

a flexible substrate;

an intermediate layer that is supported on a surface of the flexible substrate;

a first device layer disposed over the flexible substrate and at least partially embedded in the intermediate layer, the first device layer comprising:

a first device component that forms part of a two-dimensional array;

at least two stretchable interconnects, each of the at least two stretchable interconnects having a first end, a second end, and a central portion that is between the first and the second end, wherein:

the at least two stretchable interconnects extend along at least two different directions from the first device component in a plane of the supporting surface to form the two dimensional array;

the first end of each of the at least two stretchable interconnects is in electrical communication with the first device component;

the central portion of each of the at least two stretchable interconnects comprises a bent configuration region;

an interlayer disposed over the first device layer, the interlayer comprising a polymeric material;

a second device layer disposed over the interlayer, the second device layer comprising a second device component; and

an electrical interconnect having a first end and a second end, the electrical interconnect extending through a portion of the interlayer,

wherein the first end of the interconnect is in electrical communication with the first device component, and

wherein the second end of the interconnect is in electrical communication with the second device component.

2. The multilayer device of claim 1 , wherein the interlayer has a thickness from about 500 nm to 5 microns.

3. The multilayer device of claim 1 , wherein the interlayer has a thickness of less than or equal to about 5 microns.

4. The multilayer device of claim 1 , wherein the interlayer comprises a polyimide.

5. The multilayer device of claim 1 , wherein the first device component is spatially aligned with at least a portion of the second device component.

6. The multilayer device of claim 1 , further comprising an encapsulating layer, wherein the encapsulating layer at least partially encapsulates the second device layer.

7. The multilayer device of claim 6 , further comprising at least one first stretchable semiconductor structure in electrical communication with the first device component, wherein the second device layer further comprises at least one second stretchable semiconductor structure in electrical communication with the second device component.

8. The multilayer device of claim 7 , wherein the encapsulating layer at least partially encapsulates at least one of:

the second device component, and

the at least one second stretchable semiconductor structure.

9. The multilayer device of claim 6 , wherein the encapsulating layer comprises at least one of a polyimide and a polyurethane.

10. The multilayer device of claim 1 , wherein the flexible substrate comprises an elastomer.

11. The flexible multilayer device of claim 1 , further comprising at least one first stretchable semiconductor in electrical communication with the first device component, wherein the at least one first stretchable semiconductor structure is at least partially embedded in the intermediate layer.

12. The multilayer device of claim 1 , further comprising at least one first stretchable semiconductor in electrical communication with the first device component, wherein the at least one first stretchable semiconductor structure includes a plurality of stretchable semiconductor structures arranged in an array or pattern.

13. The multilayer device of claim 12 , wherein the pattern includes a grid configuration, a floral configuration, a bridge configuration, or any combination thereof.

14. The multilayer device of claim 1 , wherein at least one of the first device component and the second device component comprises a material selected from the group consisting of: single crystal silicon, Si, Ge, SiC, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InP, InAs, InSb, ZnO, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, PbS, PbSe, PbTe, AlGaAs, AlInAs, AlInP, GaAsP, GaInAs, GaInP, AlGaAsSb, AlGaInP, SiGe, GaInAsP, and a carbon nanomaterial.

15. The multilayer device of claim 1 , wherein at least one of the first device component and the second device component comprises an optical device, an opto-electronic device, a microfluidic device, a microelectromechanical system, a nanoelectromechanical system, or any combination thereof.

16. The multilayer device of claim 1 , further comprising at least one first stretchable semiconductor in electrical communication with the first device component, wherein the at least one first stretchable semiconductor structure has a coiled conformation, a wrinkled conformation, a buckled conformation, or a wavy configuration.

17. The multilayer device of claim 1 , further comprising at least one first stretchable semiconductor in electrical communication with the first device component, wherein the at least one first stretchable semiconductor structure is in electrical communication with the first device component.

18. A multilayer device comprising:

a flexible substrate;

an intermediate layer that is supported on a surface of the flexible substrate;

a first device layer disposed over the flexible substrate and at least partially embedded in the intermediate layer, the first device layer comprising:

a first device component that forms part of a two-dimensional array;

at least two stretchable interconnects, each of the at least two stretchable interconnects having a first end, a second end, and a central portion that is between the first and the second end, wherein:

the at least two stretchable interconnects extend along at least two different directions from the first device component in a plane of the supporting surface to form the two dimensional array;

the first end of each of the at least two stretchable interconnects is in electrical communication with the first device component;

the central portion of each of the at least two stretchable interconnects comprises a bent configuration region; and

an interlayer disposed over the first device layer, the interlayer comprising a polymeric material;

a second device layer disposed over the interlayer, the second device layer comprising:

a second device component that forms part of a two-dimensional array;

at least two stretchable interconnects, each of the at least two stretchable interconnects having a first end, a second end, and a central portion that is between the first and the second end, wherein:

the at least two stretchable interconnects extend along at least two different directions from the second device component in a plane of the supporting surface to form the two dimensional array;

the first end of each of the at least two stretchable interconnects is in electrical communication with the second device component;

the central portion of each of the at least two stretchable interconnects comprises a bent configuration region; and

an electrical interconnect having a first end and the second end, the electrical interconnect extending through a portion of the interlayer,

wherein the first end of the interconnect is in electrical communication with the first device component, and

wherein the second end of the interconnect is in electrical communication with the second device component.

19. The multilayer device of claim 18 , further comprising an encapsulating layer, wherein the encapsulating layer at least partially encapsulates the second device layer.

20. The multilayer device of claim 18 , wherein the flexible substrate comprises an elastomer.

21. The multilayer device of claim 18 , further comprising:

at least two first stretchable semiconductor structures in electrical communication with the first device component,

wherein the at least two first stretchable semiconductor structures extend along at least two different directions from the first device component in the plane of the first device layer to form the two-dimensional array;

wherein one or more of the least two first stretchable semiconductor structures is at least partially embedded in the intermediate layer.

22. The multilayer device of claim 18 , further comprising:

at least two first stretchable semiconductor structures in electrical communication with the first device component,

wherein the at least two first stretchable semiconductor structures extend along at least two different directions from the first device component in the plane of the first device layer to form the two-dimensional array;

wherein the at least two first stretchable semiconductor structures in the two-dimensional array are arranged in a grid configuration, a floral configuration, a bridge configuration, or any combination thereof.

23. The multilayer device of claim 18 , wherein at least one of the first device component and the second device component comprises a material selected from the group consisting of: single crystal silicon, Si, Ge, SiC, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InP, InAs, InSb, ZnO, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, PbS, PbSe, PbTe, AlGaAs, AlInAs, AlInP, GaAsP, GaInAs, GaInP, AlGaAsSb, AlGaInP, SiGe, GaInAsP, and a carbon nanomaterial.

24. The multilayer device of claim 18 , wherein at least one of the first device component and the second device component comprises an optical device, an opto-electronic device, a microfluidic device, a microelectromechanical system, a nanoelectromechanical system, or any combination thereof.

25. The multilayer device of claim 18 , further comprising:

at least two first stretchable semiconductor structures in electrical communication with the first device component,

wherein the at least two first stretchable semiconductor structures extend along at least two different directions from the first device component in the plane of the first device layer to form the two-dimensional array;

wherein the at least two first stretchable semiconductor structures have a coiled conformation, a wrinkled conformation, a buckled conformation, or a wavy configuration.

26. The multilayer device of claim 18 , further comprising:

at least two second stretchable semiconductor structures in electrical communication with the second device component,

wherein the at least two second stretchable semiconductor structures extend along at least two different directions from the first device component in the plane of the second device layer to form a two-dimensional array.

27. The multilayer device of claim 1 , further comprising at least one first stretchable semiconductor structure in electrical communication with the first device component.

28. The multilayer device of claim 18 , further comprising:

at least two first stretchable semiconductor structures in electrical communication with the first device component,

wherein the at least two first stretchable semiconductor structures extend along at least two different directions from the first device component in a plane of the first device layer to form a two-dimensional array.

29. The multilayer device of claim 1 , wherein at least one of the first device component and the second device component comprises a physical sensor, biological sensor, a chemical sensor, an accelerometer, a pressure sensor, or any combination thereof.

30. The multilayer device of claim 18 , wherein at least one of the first device component and the second device component comprises a physical sensor, biological sensor, a chemical sensor, an accelerometer, a pressure sensor, or any combination thereof.

31. The multilayer device of claim 1 , wherein the stretchable interconnects, the electrical interconnect, or both comprises a high conductivity material.

32. The multilayer device of claim 31 , wherein the high conductivity material comprises a metal or an alloy thereof.

33. The multilayer device of claim 18 , wherein the stretchable interconnects, the electrical interconnect, or both comprises a high conductivity material.

34. The multilayer device of claim 33 , wherein the high conductivity material comprises a metal or an alloy thereof.

35. The multilayer device of claim 1 , wherein the stretchable interconnects, the electrical interconnect, or both comprises a semiconductor material.

36. The multilayer device of claim 35 , wherein the semiconductor material comprises silicon, indium tin oxide, or GaAs.

37. The multilayer device of claim 18 , wherein the stretchable interconnects, the electrical interconnect, or both comprises a semiconductor material.

38. The multilayer device of claim 37 , wherein the semiconductor material comprises silicon, indium tin oxide, or GaAs.

Assignments (2)
CONFIRMATORY LICENSE Recorded Mar 25, 2015
From: UNIVERSITY OF ILLINOIS, URBANA-CHAMPAIGN
To: ENERGY,UNITED STATES DEPARTMENT OF
Reel/Frame 035343/0784 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2015
From: NUZZO, RALPH G.; LEE, KEON JAE; KANG, SEONG JUN; ZHU, ZHENGTAO; MENARD, ETIENNE; AHN, JONG-HYUN; KIM, HOON-SIK; KHANG, DAHL-YOUNG; ROGERS, JOHN A.; MEITL, MATTHEW; SUN, YUGANG; KO, HEUNG CHO; CARLSON, ANDREW; CHOI, WON MOOK; STOYKOVICH, MARK; JIANG, HANQING; HUANG, YONGGANG
To: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
Reel/Frame 034720/0221 →
Continuity (14)
Continuation 13441598 · Apr 6, 2012
Continuation 11851182 · Sep 6, 2007
Continuation In Part 11145574 · Jun 2, 2005
Continuation In Part 11145542 · Jun 2, 2005
Continuation In Part 11423287 · Jun 9, 2006
Provisional Application 60944626 · Jun 18, 2007
Provisional Application 60824683 · Sep 6, 2006
Provisional Application 60577077 · Jun 4, 2004
Provisional Application 60601061 · Aug 11, 2004
Provisional Application 60650305 · Feb 4, 2005
Provisional Application 60663391 · Mar 18, 2005
Provisional Application 60677617 · May 4, 2005
Provisional Application 60790104 · Apr 7, 2006
Related Publication 20140374872A1 · Dec 25, 2014