Temperature management of aluminium nitride electrostatic chuck

1. An unseasoned substrate support assembly comprising:

a ceramic body, an upper surface of the ceramic body comprising:

a first portion proximate to a center of the ceramic body and having a first roughness profile, the first portion comprising a first plurality of mesas, wherein surfaces of the first plurality of mesas have a first roughness corresponding to the first roughness profile; and

a second portion distal to the center of the ceramic body and having a second roughness profile, the second portion comprising an outer ring and a second plurality of mesas, wherein surfaces of the outer ring and the second plurality of mesas have a second roughness corresponding to the second roughness profile, the second roughness being a lower roughness than the first roughness;

wherein areas of the first and second portions are based on radial distances from the center of the ceramic body; and

a thermally conductive base bonded to a lower surface of the ceramic body.

2. The unseasoned substrate support assembly of claim 1 , wherein the first roughness profile comprises an average roughness of approximately 10-16 micro-inches and the second roughness profile comprises an average roughness of less than 10 micro-inches.

3. The unseasoned substrate support assembly of claim 2 , wherein the average roughness of approximately 10-16 micro-inches for the first portion and the average roughness of less than 10 micro-inches for the second portion cause a thermal gradient between the first portion and the second portion to be approximately 15 degrees C.

4. The unseasoned substrate support assembly of claim 1 , wherein an atomic concentration of carbon on the upper surface of the ceramic body is less than 10 percent of particles on the upper surface.

5. The unseasoned substrate support assembly of claim 1 , wherein the ceramic body comprises Aluminum Nitride (AlN) and wherein the thermally conductive base is bonded to the lower surface of the ceramic body by a silicone bond.

6. The unseasoned substrate support assembly of claim 1 , wherein the unseasoned substrate support assembly is a substrate support assembly that has experienced less than 20 hours of processing after manufacture.

7. The unseasoned substrate support assembly of claim 1 , the upper surface of the ceramic body further comprising:

a third portion, between the first portion and the second portion, having a third roughness profile with a third roughness that is greater than the second roughness and lower than the first roughness, wherein an average roughness of the first roughness profile is about 13 micro-inches, an average roughness of the third roughness profile is about 10 micro-inches, and an average roughness of the second roughness profile is about 4.5 micro-inches, and wherein the first portion extends radially 0-75 mm from the center, the third portion extends radially 75-140 mm from the center, and the second portion extends radially 140-150 mm from the center.

8. The unseasoned substrate support assembly of claim 1 , wherein the first portion extends radially approximately 0-140 mm from the center and the second portion extends radially approximately 140-150 mm from the center.

9. The unseasoned substrate support assembly of claim 1 , wherein the second portion extends radially inward from an edge of the ceramic body by about 10 mm.

10. An electrostatic chuck having been manufactured by a manufacturing process comprising:

providing a ceramic body;

polishing an upper surface of the ceramic body to an average roughness of greater than 10 micro-inches, the upper surface comprising 1) a first portion that is proximate to a center of the upper surface of the ceramic body and comprises a first plurality of mesas that are polished to the average roughness of greater than 10 micro-inches and 2) a second portion that is distal to the center of the upper surface of the ceramic body and comprises an outer ring and a second plurality of mesas that are polished to the average roughness of greater than 10 micro-inches;

polishing the second portion of the upper surface of the ceramic body without polishing the first portion of the upper surface of the ceramic body, wherein the second portion is polished to an average roughness of less than 10 micro-inches to cause the outer ring and the second plurality of mesas to have the average roughness of less than 10 micro-inches; and

bonding a thermally conductive base to a lower surface of the ceramic body after polishing the second portion.

11. The electrostatic chuck of claim 10 , wherein the first portion is polished to an average roughness of approximately 10-16 micro-inches.

12. The electrostatic chuck of claim 10 , the manufacturing process further comprising:

performing oxygen ashing on the ceramic body after performing the bonding, wherein an atomic concentration of carbon on the upper surface of the ceramic body is less than 10 percent of particles on the upper surface after performing the oxygen ashing.

13. The electrostatic chuck of claim 12 , wherein the oxygen ashing is performed for a duration of one hour or greater.

14. The electrostatic chuck of claim 10 , wherein:

polishing the upper surface of the ceramic body comprises using a first polishing tool and a first slurry having a first grit; and

polishing the second portion of the ceramic body comprises using a second polishing tool and a second slurry having a second grit that is finer than the first grit.

15. The electrostatic chuck of claim 10 , further comprising:

performing a first cleaning of the ceramic body after polishing the upper surface;

performing a second cleaning of the ceramic body after polishing the second portion; and

performing a third cleaning of the electrostatic chuck after the bonding.

16. A substrate support assembly comprising:

a ceramic body, an upper surface of the ceramic body comprising:

a first portion proximate to a center of the ceramic body and having a first roughness profile comprising an average roughness of approximately 10-16 micro-inches, the first portion comprising a first plurality of mesas, wherein surfaces of the first plurality of mesas have a first roughness corresponding to the first roughness profile; and

a second portion distal to the center of the ceramic body and having a second roughness profile comprising an average roughness of less than 10 micro-inches, the second portion comprising an outer ring and a second plurality of mesas, wherein surfaces of the outer ring and the second plurality of mesas have a second roughness corresponding to the second roughness profile;

wherein areas of the first and second portions are based on radial distances from the center of the ceramic body; and

a thermally conductive base bonded to a lower surface of the ceramic body.