IP Library Granted Patent US 9,385,033
Granted Patent B2
US 9,385,033 · App. 14/040,109 · Granted Jul 5, 2016

Method of forming a metal from a cobalt metal precursor

Inventors: James M. Blackwell (Portland, OR); Scott B. Clendenning (Portland, OR); John J. Plombon (Portland, OR); Patricio E. Romero (Portland, OR)
Assignee: Intel Corporation
H01L21/76843C07F15/06C23C16/06C23C16/16C23C16/18C23C16/45553H01L21/28556H01L21/28562H01L21/76898
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Quick Facts
Patent No.
US 9,385,033
App. No.
14/040,109
Granted
Jul 5, 2016
Kind
B2
Abstract

A metal precursor and a method comprising decomposing a metal precursor on an integrated circuit device; and forming a metal from the metal precursor, wherein the metal precursor is selected from the group consisting of (i) a Co 2 (CO) 6 (R 1 C≡CR 2 ), wherein R 1 and R 2 are individually selected from a straight or branched monovalent hydrocarbon group have one to six carbon atoms that may be interrupted and substituted; (ii) a mononuclear cobalt carbonyl nitrosyl; (iii) a cobalt carbonyl bonded to one of a boron, indium, germanium and tin moiety; (iv) a cobalt carbonyl bonded to a mononuclear or binuclear allyl; and (v) a cobalt(II) complex comprising nitrogen-based supporting ligands.

Claims (33)

1. A method comprising:

decomposing a metal precursor on an integrated circuit device; and

forming a metal from the metal precursor,

wherein the metal precursor is selected from the group consisting of:

(i) a mononuclear cobalt monocarbonyl nitrosyl or cobalt dicarbonyl nitrosyl;

(ii) a cobalt carbonyl bonded to one of a boron, indium, germanium and tin moiety;

(iii) a mononuclear cobalt carbonyl bonded to a mononuclear or binuclear allyl; and

(iv) a cobalt(II) complex comprising nitrogen-based supporting ligands selected from the group consisting of:

wherein R 3 , R 4 , R 5 and R 6 are individually selected from a straight or branched monovalent hydrocarbon group have one to three carbon atoms that may be substituted and L 1 , L 2 , L 3 and L 4 are independently selected from a substituted amine and quinuclidine.

2. The method of claim 1 , wherein the metal precursor comprises a mononuclear cobalt carbonyl nitrosyl selected from the group consisting of:

wherein R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and R 17 are independently selected from a straight or branched chain alkyl having one to four carbon atoms.

3. The method of claim 1 , wherein the metal precursor is selected from the group consisting of:

wherein R 18 , R 19 , R 20 , R 21 , R 22 and R 23 are independently selected from a straight or branched chain alkyl having one to four carbon atoms and R 20 and R 21 may further individually be a substituted amine.

4. The method of claim 1 , wherein the metal precursor is selected from the group consisting of:

wherein R 24 , R 25 and R 26 are independently selected from a straight or branched chain alkyl having one to the three carbon atoms and L 5 , L 6 and L 7 are independently selected from the group consisting of:

5. The method of claim 1 , wherein forming the metal comprises combining the precursor with a coreactant.

6. A method comprising:

loading an integrated circuit device in a deposition chamber;

depositing a transition metal precursor on the integrated circuit device; and

decomposing the transition metal precursor with a coreactant;

wherein the transition metal precursor is selected from the group consisting of:

(i) a mononuclear cobalt monocarbonyl nitrosyl or cobalt dicarbonyl nitrosyl;

(ii) a cobalt carbonyl bonded to one of a boron, indium, germanium and tin moiety;

(iii) a mononuclear cobalt carbonyl bonded to a mononuclear or binuclear allyl; and

(iv) a cobalt (II) complex comprising nitrogen-based supporting ligands selected from the group consisting of:

wherein R 3 is selected from a straight or branched monovalent hydrocarbon group have one to three carbon atoms and L is selected from Me 2 EtN, Me 3 N, Et 3 N and quinuclidine.

7. The method of claim 6 , wherein the metal precursor comprises a mononuclear cobalt carbonyl nitrosyl selected from the group consisting of:

wherein R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 and R 15 are independently selected from a straight or branched chain alkyl having one to the three carbon atoms.

8. The method of claim 6 , wherein the metal precursor is selected from the group consisting of:

wherein R 22 and R 23 are independently selected from a straight or branched chain alkyl having one to the four carbon atoms and R 20 and R 21 may further individually be a substituted amine.

9. The method of claim 6 , wherein the metal precursor is selected from the group consisting of:

wherein R 24 , R 25 and R 26 are independently selected from a straight or branched chain alkyl having one to the three carbon atoms and L 2 , L 3 and L 4 are independently selected from the group consisting of:

10. The method of claim 6 , wherein the coreactant is selected from the group consisting of a hydrogen gas or plasma, an ammonia gas or plasma, a hydrazine, a borane, an alane and a silane.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 10, 2014
From: BLACKWELL, JAMES M.; CLENDENNING, SCOTT B.; PLOMBON, JOHN J.; ROMERO, PATRICIO E.
To: INTEL CORPORATION
Reel/Frame 032187/0633 →
Continuity (1)
Related Publication 20150093890A1 · Apr 2, 2015