Insitu epitaxial deposition of front and back junctions in single crystal silicon solar cells
Fabrication of a single crystal silicon solar cell with an insitu epitaxially deposited very highly doped p-type silicon back surface field obviates the need for the conventional aluminum screen printing step, thus enabling a thinner silicon solar cell because of no aluminum induced bow in the cell. Furthermore, fabrication of a single crystal silicon solar cell with insitu epitaxial p-n junction formation and very highly doped n-type silicon front surface field completely avoids the conventional dopant diffusion step and one screen printing step, thus enabling a cheaper manufacturing process.
1. A thin epitaxial silicon solar cell comprising:
an epitaxial film of highly doped p-type silicon, said highly doped p-type silicon epitaxial film having a resistivity of less than 10 mohm-cm, said highly doped p-type silicon epitaxial film being a back surface field (BSF) layer;
an epitaxial film of p-type silicon on said BSF layer, said p-type silicon epitaxial film being a base layer;
an emitter layer at the surface of said base layer;
front contacts to said emitter layer on the front surface of said thin epitaxial silicon solar cell; and
back contacts to said BSF layer on the back surface of said thin epitaxial silicon solar cell, said back contacts being patterned to cover less than fifty percent of the back surface of said thin epitaxial silicon solar cell;
wherein said thin epitaxial silicon solar cell is less than 150 microns thick and wherein said thin epitaxial silicon solar cell is bifacial.
2. The thin epitaxial silicon solar cell of claim 1 , wherein said back contacts cover less than ten percent of the back surface of said thin epitaxial silicon solar cell.
3. The thin epitaxial silicon solar cell of claim 1 , wherein said front contacts and said back contacts are formed of the same metal.
4. The thin epitaxial silicon solar cell of claim 3 , wherein said metal comprises silver.
5. The thin epitaxial silicon solar cell of claim 1 , wherein said front contacts and said back contacts are patterned as grids.
6. The thin epitaxial silicon solar cell of claim 5 , wherein the front contact grid and the back contact grid have the same dimensions.
7. The thin epitaxial silicon solar cell of claim 6 , wherein the front contact grid and the back contact grid are aligned front-to-back.
8. The thin epitaxial silicon solar cell of claim 1 , wherein the surface of said base layer is texture etched.
9. The thin epitaxial silicon solar cell of claim 1 , wherein said emitter layer is diffusion doped with an n-type dopant.
10. The thin epitaxial silicon solar cell of claim 1 , wherein said thin epitaxial silicon solar cell is a single crystal epitaxial silicon solar cell.
11. A thin epitaxial silicon solar cell comprising:
an epitaxial film of highly doped p-type silicon, said highly doped p-type silicon epitaxial film having a resistivity of less than 10 mohm-cm, said highly doped p-type silicon film being an emitter layer;
an epitaxial film of n-type silicon on said emitter layer, said n-type silicon epitaxial film being a base layer;
an epitaxial film of highly doped n-type silicon on said base layer, said highly doped n-type silicon epitaxial film having a a resistivity of less than 10 mohm-cm, said highly doped n-type silicon epitaxial film being a front surface field (FSF) layer;
front contacts to said FSF layer on the front surface of said thin epitaxial silicon solar cell; and
back contacts to said emitter layer on the back surface of said thin epitaxial silicon solar cell, said back contacts being patterned to cover less than fifty percent of the back surface of said thin epitaxial silicon solar cell;
wherein said thin epitaxial silicon solar cell is less than 150 microns thick and wherein said thin epitaxial silicon solar cell is bifacial.
12. The thin epitaxial silicon solar cell of claim 11 , wherein said back contacts cover less than ten percent of the back surface of said thin epitaxial silicon solar cell.
13. The thin epitaxial silicon solar cell of claim 11 , wherein said front contacts and said back contacts are formed of the same metal.
14. The thin epitaxial silicon solar cell of claim 13 , wherein said metal comprises silver.
15. The thin epitaxial silicon solar cell of claim 11 , wherein said front contacts and said back contacts are patterned as grids.
16. The thin epitaxial silicon solar cell of claim 15 , wherein the front contact grid and the back contact grid have the same dimensions .
17. The thin epitaxial silicon solar cell of claim 16 , wherein the front contact grid and the back contact grid are aligned front-to-back.
18. The thin epitaxial silicon solar cell of claim 11 , wherein the surface of said FSF layer is texture etched.
19. The thin epitaxial silicon solar cell of claim 18 , further comprising an anti-reflection coating on said FSF layer.
20. A thin epitaxial silicon solar cell comprising:
a first epitaxial film, said first epitaxial film being a highly doped p-type silicon film having a resistivity of less than 10 mohm-cm;
a second epitaxial film on said first epitaxial film, said second epitaxial film being a first doped silicon film, said first doped silicon film being a base layer;
a third epitaxial film on said second epitaxial film, said third epitaxial film being a second doped silicon film;
front contacts to said second doped silicon film on a front surface of said thin epitaxial silicon solar cell; and
back contacts to said highly doped p-type silicon film on a back surface of said thin epitaxial silicon solar cell, said back contacts being patterned to cover less than fifty percent of said back surface of said thin epitaxial silicon solar cell;
wherein said thin epitaxial silicon solar cell is less than 150 microns thick and wherein said thin epitaxial silicon solar cell is bifacial.
21. The thin epitaxial silicon solar cell of claim 20 , wherein said thin epitaxial silicon solar cell is a single crystal epitaxial silicon solar cell.