Treatment liquid supply apparatus and substrate treatment apparatus including the same
A treatment liquid supply apparatus supplies a treatment liquid to a predetermined object for treatment of a substrate, and recovers the supplied treatment liquid for reuse. The apparatus includes: a first tank in which the treatment liquid to be supplied to the object is stored; a second tank in which the treatment liquid recovered from the object is stored; a transfer unit which transfers the treatment liquid from the second tank to the first tank; a first temperature regulating unit which regulates the temperature of the treatment liquid to be supplied from the first tank to the object; and a second temperature regulating unit which regulates the temperature of the treatment liquid to be transferred from the second tank to the first tank by the transfer unit.
1. A substrate treatment apparatus comprising:
a treatment section for treatment of a substrate disposed therein, and
a treatment liquid supply apparatus which supplies a treatment liquid to the treatment section for treatment of the substrate with the treatment liquid, and recovers the supplied treatment liquid for reuse,
the treatment liquid supply apparatus comprising:
a first tank in which the treatment liquid to be supplied to the treatment section is stored;
a second tank in which the treatment liquid recovered from the treatment section is stored;
a treatment liquid supply pipe connected between the first tank and the treatment section;
a first pump disposed in the treatment liquid supply pipe and configured to supply the treatment liquid from the first tank to the treatment section through the treatment liquid supply pipe,
a treatment liquid transfer pipe connected between the first tank and the second tank,
a second pump disposed in the treatment liquid transfer pipe and configured to transfer the treatment liquid from the second tank to the first tank through the treatment liquid transfer pipe;
a first temperature regulating unit configured to regulate a temperature of the treatment liquid to be supplied from the first tank to the treatment section through the treatment liquid supply pipe;
a second temperature regulating unit configured to regulate a temperature of the treatment liquid to be transferred from the second tank to the first tank through the treatment liquid transfer pipe;
a recovery pipe connected between the treatment section and the second tank so as to recover the treatment liquid that has been used for a treatment of the substrate in the treatment section; and
a fresh liquid replenishment pipe configured to replenish the second tank with a fresh treatment liquid, without said fresh treatment liquid going through the first tank, wherein said replenishment pipe receives said fresh treatment liquid from a central pipe which extends externally of said substrate treatment apparatus for being connected to an external fresh treatment liquid supply source.
2. A substrate treatment apparatus according to claim 1 , wherein the first temperature regulating unit is configured to regulate a temperature of the treatment liquid in the first tank.
3. A substrate treatment apparatus according to claim 1 , wherein the second temperature regulating unit is configured to regulate a temperature of the treatment liquid in the second tank.
4. A substrate treatment apparatus according to claim 1 , further comprising a control section configured to
control the first temperature regulating unit to regulate the temperature of the treatment liquid in the first tank to a predetermined first temperature;
cause the treatment liquid supply apparatus to supply the treatment liquid in the first tank whose temperature has been regulated to the treatment section;
control the second temperature regulating unit to regulate the temperature of the treatment liquid in the second tank to a predetermined second temperature that is equal to or substantially equal to the first temperature; and
cause the treatment liquid supply apparatus to transfer the treatment liquid in the second tank whose temperature has been regulated to the first tank.
5. A substrate treatment apparatus according to claim 1 , wherein the first and second temperature regulating units each regulate the temperature of the treatment liquid at a temperature level not lower than a room temperature of about 25° C.
6. A substrate treatment apparatus according to claim 1 , wherein the treatment liquid supply apparatus further comprises a filter unit which filters the treatment liquid to be transferred from the second tank to the first tank through the transfer pipe.
7. A substrate treatment apparatus according to claim 1 , further comprising:
a substrate disposed in the treatment section.
8. A substrate treatment apparatus according to claim 1 , wherein
the treatment section comprises a spin chuck configured to hold and spin the substrate; and
the treatment liquid supply apparatus comprises a supply pipe in the treatment section directed at the spin chuck for supplying said treatment liquid to said substrate.