Handle substrates of composite substrates for semiconductors
A handle substrate 1 is made of a translucent ceramics. An average density of pores having a size of 0.5 to 3.0 μm included in a surface region 2 A on the side of a bonding face 1 a of the handle substrate 1 is 50 counts/mm 2 or smaller. It is formed a region 3 , whose average density of pores having a size of 0.5 to 3.0 μm is 100 counts/mm 2 or larger, in the handle substrate 1 . The translucent ceramics has an average grain size of 5 to 60 μm.
1. A handle substrate of a composite substrate for a semiconductor; said handle substrate comprising a translucent ceramic,
said handle substrate comprising a surface region on a side of a bonding face of said handle substrate, said surface region comprising pores having a size of 0.5 to 3.0 μm at an average density of 50 counts/mm 2 or smaller, and
said handle substrate comprising a region formed therein comprising pores having a size of 0.5 to 3.0 μm at an average density of 100 counts/mm 2 or larger,
wherein said translucent ceramic has an average grain size of 5 to 60 μm,
wherein said translucent ceramic has a relative density of 98 percent or higher, and
wherein a ratio of said average density of said pores in said surface region on a side of said bonding face to an average density of said pores in a region through which a central line of said substrate in a direction of thickness passes is 1:2 to 1:40.
2. The handle substrate of claim 1 , comprising pores having a size of 0.5 to 3.0 μm at an average density of 1000 counts/mm 2 or smaller in said handle substrate.
3. The handle substrate of claim 1 , wherein said translucent ceramic comprises polycrystalline alumina.
4. The handle substrate of claim 1 , wherein a microscopic central line average surface roughness Ra of said bonding face of said handle substrate is 3.0 nm or smaller, and
wherein an in-line transmittance of a light having a wavelength of 650 nm is 60 percent or lower.
5. A composite substrate for a semiconductor, said composite substrate comprising said handle substrate of claim 1 and a donor substrate bonded to said bonding face of said handle substrate directly or through a bonding region.
6. The composite substrate of claim 5 , wherein said donor substrate comprises monocrystalline silicon.
7. A handle substrate of a composite substrate for a semiconductor; said handle substrate comprising a translucent ceramic,
said handle substrate comprising a surface region on a side of a bonding face of said handle substrate, said surface region comprising pores having a size of 0.5 to 3.0 μm at an average density of 50 counts/mm 2 or smaller, and
said handle substrate comprising a region formed therein comprising pores having a size of 0.5 to 3.0 μm at an average density of 100 counts/mm 2 or larger,
wherein said translucent ceramic has an average grain size of 5 to 60 μm,
wherein said translucent ceramic has a relative density of 98 percent or higher,
wherein a microscopic central line average surface roughness Ra of said bonding face of said handle substrate is 3.0 nm or smaller, and
wherein an in-line transmittance of a light having a wavelength of 650 nm is 60 percent or lower.
8. The handle substrate of claim 7 , comprising pores having a size of 0.5 to 3.0 μm at an average density of 1000 counts/mm 2 or smaller in said handle substrate.
9. The handle substrate of claim 7 , wherein said translucent ceramic comprises polycrystalline alumina.
10. A composite substrate for a semiconductor, said composite substrate comprising said handle substrate of claim 7 and a donor substrate bonded to said bonding face of said handle substrate directly or through a bonding region.
11. The composite substrate of claim 10 , wherein said donor substrate comprises monocrystalline silicon.