Display substrate and method of manufacturing a display substrate
A display substrate includes an active pattern, a gate electrode, a first insulation layer and a pixel electrode. The active pattern is disposed on a base substrate. The active pattern includes a metal oxide semiconductor. The gate electrode overlaps the active pattern. The first insulation layer covers the gate electrode and the active pattern, and a contact hole is defined in the first insulation layer. The pixel electrode is electrically connected to the active pattern via the contact hole penetrating the first insulation layer. A first angle defined by a bottom surface of the first insulation layer and a sidewall of the first insulation layer exposed by the contact hole is between about 30° and about 50°.
1. A display substrate, comprising:
an active pattern on a base substrate, the active pattern comprising a metal oxide semiconductor;
a gate electrode overlapping the active pattern;
a gate insulation layer pattern between the active pattern and the gate electrode;
an insulation member comprising a first insulation layer covering the gate electrode: a portion of the first insulation layer extended to surround a side surface of the gate insulation layer pattern and to contact a top surface of the active pattern,
a contact hole which is defined in the extended portion of the first insulation layer, the contact hole exposing a sidewall of the extended portion of the first insulation layer; and
a pixel electrode in contact with the active pattern at the contact hole to be electrically connected to the active pattern,
wherein a first angle defined by a bottom surface of the insulation member and the a sidewall of the extended portion of the first insulation layer exposed by the contact hole, is between about 30° and about 50°
wherein a portion of the pixel electrode in contact with the active pattern is extended along the exposed sidewall of the extended portion of the first insulation layer, and wherein the extended portion of the pixel electrode has a uniform thickness at the active pattern and along the exposed sidewall of the extended portion of the first insulation layer.
2. The display substrate of claim 1 , wherein the insulation member comprises silicon oxide, silicon nitride, silicon oxy nitride or aluminum oxide.
3. The display substrate of claim 1 , wherein the pixel electrode comprises a transparent conductive material.
4. The display substrate of claim 1 , wherein
a top surface of the insulation member contacts a bottom surface of the pixel electrode, and
the bottom surface of the insulation member contacts the top surface of the active pattern.
5. The display substrate of claim 1 , wherein
the insulation member further comprises a second insulation layer between the first insulation layer and the pixel electrode, the second insulation layer covering the gate electrode, a portion of the second insulation layer covering the gate electrode extended to surround the side surface of the gate insulation layer pattern, and
wherein the contact hole is further defined in the extended portion of the second insulation layer and exposes a sidewall of the extended portion of the second insulation layer.
6. The display substrate of claim 5 , wherein a second angle defined by a bottom surface of the second insulation layer, and the sidewall of the second insulation layer exposed by the contact hole, is between about 30° and about 50°.
7. The display substrate of claim 6 , wherein the first angle is smaller than the second angle.
8. The display substrate of claim 1 , wherein the uniform thickness is about 500 angstroms to about 600 angstroms, respectively.
9. The display substrate of claim 1 , wherein the pixel electrode has an electrical contact resistance below about 1.0E4 ohms.
10. The display substrate of claim 1 , further comprising:
a source electrode electrically connected to the active pattern.