Apparatus, in particular end effector
An apparatus, in particular end effector, for receiving, transporting and/or positioning a wafer frame which is covered by a carrier film for carrying a wafer, has a holder which has vacuum nozzles for holding the wafer frame on the apparatus, and has a centering device which has at least one stop, which can engage in a cutout in the wafer frame, for centering the wafer frame. In order to precisely position the wafer frame, the holder has Bernoulli nozzles for holding and moving the wafer frame in the direction of the stop without contact, and the stop is mounted such that it can be adjusted against the movement direction generated by the Bernoulli nozzles from an initial position to a centering position, which differs from the initial position, for centering the wafer frame.
1. Apparatus, particularly end effector, for taking up, transporting and/or positioning of a wafer frame ( 2 ), which is covered by a carrier film ( 3 ) for carrying a wafer ( 4 ), having a holder ( 5 ) that has vacuum nozzles ( 6 ) for holding the wafer frame ( 2 ) on the apparatus, and having a centering device ( 28 ) that has at least one stop ( 7 ) that can engage into a recess ( 8 ) of the wafer frame ( 2 ), for centering of the wafer frame ( 2 ), wherein the holder ( 5 ) has Bernoulli nozzles ( 9 , 90 ) for contact-free holding and moving of the wafer frame ( 2 ) in the direction of the stop ( 7 ), and wherein the stop ( 7 ) is adjustably mounted counter to the movement direction ( 11 ) produced by the Bernoulli nozzles ( 9 , 90 ), from a starting position ( 12 ) into a centering position ( 13 ) for centering of the wafer frame ( 2 ) that is different from the former.
2. Apparatus according to claim 1 , wherein the stop ( 7 ) forms two parallel centering projections ( 14 ), which each engage into a recess ( 8 ) on the wafer frame.
3. Apparatus according to claim 1 , wherein the centering device ( 28 ) has a linear guide ( 15 ) between stop ( 7 ) and apparatus ( 1 ).
4. Apparatus according to claim 1 , wherein the centering device ( 28 ) has a compressed air drive ( 17 ) for movement of the stop ( 7 ).
5. Apparatus according to claim 1 , wherein the centering device ( 28 ) has a spring element ( 20 ) connected with the stop ( 7 ), for return of the stop ( 7 ).
6. Apparatus according to claim 1 , wherein Bernoulli nozzles ( 9 , 90 ) are disposed so as to be asymmetrically distributed over the holder ( 5 ).
7. Apparatus according to claim 1 , wherein the Bernoulli nozzles ( 9 , 90 ) are disposed on the holder ( 5 ), distributed in the film region between wafer frame ( 2 ) and wafer ( 4 ), particularly concentrically.
8. Apparatus according to claim 1 , wherein the Bernoulli nozzles ( 9 , 90 ) are directed outward at a slant and comprise a stop-side set of Bernoulli nozzles and an opposite set of Bernoulli nozzles.
9. Apparatus according to claim 8 , wherein the stop-side Bernoulli nozzles ( 9 ) are directed parallel to the movement direction ( 11 ), and the Bernoulli nozzles ( 90 ) that lie opposite them are directed outward at a slant, proceeding from the inner center.
10. Apparatus according to claim 8 , wherein the slant angle (α) of the stop-side Bernoulli nozzles ( 9 ) is different in size from the slant angle (β) of the opposite Bernoulli nozzles ( 90 ).
11. Apparatus according to claim 1 , wherein vacuum nozzles ( 6 ) are provided on the outer edge ( 23 ) of the holder ( 5 ), particularly at diametrically opposite projections ( 24 ) of the holder ( 5 ).
12. Apparatus according to claim 1 , wherein the holder ( 5 ) has an outer region ( 26 ) and an inner region ( 27 ) that is elevated relative to the former, which regions form a stop edge ( 25 ), particularly a circumferential edge for the wafer frame ( 2 ) between them.
13. Apparatus according to claim 12 , wherein the vacuum nozzles ( 6 ) are provided in the outer region ( 26 ) and the Bernoulli nozzles ( 9 , 90 ) are provided in the inner region ( 27 ).
14. Apparatus according to claim 12 , wherein the stop edge ( 25 ) runs at a slant toward the inner region ( 27 ).