Method and apparatus for non-thermal nail, foot, and hand fungus treatment
A method and device for treating an infection of the nail or nail bed and adjacent tissues through non-thermal means is described. The device illuminates an area with light in the near-infrared region of the electromagnetic spectrum. Preferably, light having wavelengths of from about 870 nm to about 930 nm will be used. Further, the device includes light emitting diodes that are capable of emitting ultraviolet light. These lights are intended to provide a sterile environment for a user using the apparatus.
1. A non-thermal treatment method for nail and skin fungus prevention comprising:
(a) placing at least one digit inside a chamber,
wherein said chamber has an inner surface, outer surface, a digit spacing mechanism, and a digit-receiving area,
wherein said chamber has at least two light emitting diodes, wherein at least one of the at least two light emitting diodes is capable of generating light with a wavelength of 383 nm and at least one light emitting diode is configured to generate light with a wavelength from 870 nm to 930 nm, with each of said at least two light emitting diodes being affixed to the inner surface of said chamber,
wherein the digit spacing mechanism comprises a first surface, a second surface, and at least two spacers having at least one light source embedded in each of the at least two spacers, wherein a distance between the two spacers defines an opening, and
wherein said digit-receiving area has a top and bottom surface;
(b) placing at least one digit through the opening in the digit spacing mechanism;
(c) powering at least one of the at least two light emitting diodes to generate light at wavelengths from 870 nm to 930 nm and further causes the at least one light source of the digit spacing mechanism to emit light; and
(d) allowing the digit to remain in the chamber for a first predetermined amount of time.
2. The method of claim 1 , further comprising step (e),
wherein a cleaning cycle is initiated after step (d),
wherein said cleaning cycle consists of illuminating the chamber with light at a wavelength of 383 nm for a second predetermined amount of time.
3. The method of claim 1 , wherein the device contains a processor and a memory, the processor and the memory being configured to
initiate and end at least one prescribed treatment cycle.
4. The method of claim 1 , further comprising step of turning on the at least one light emitting diode configured to produce a wavelength of 383 nm for a portion of said first predetermined amount of time.
5. The method of claim 1 wherein at least one of the at least two light emitting diodes has a viewing angle of ±10°.
6. The method of claim 1 wherein the at least two light emitting diodes have a pulse width equal to or less than 100 μs.
7. The method of claim 1 wherein the at least two light emitting diodes are coupled to a hinged lid forming the upper surface of the chamber, the hinged lid being configured to prevent light from being emitted by the at least two light emitting diodes when rotated to face away from the chamber.
8. The method of claim 6 wherein a peak current of 1.0 A is maintained for the pulse width.