IP Library Granted Patent US 9,590,021
Granted Patent B2
US 9,590,021 · App. 14/431,710 · Granted Mar 7, 2017

Thin-film transistor, array substrate, and display device

Inventor: Yuejun Tang (Guangdong, CN)
Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
H01L27/3262H01L27/124H01L27/1248H01L27/326H01L27/3241H01L27/3297H01L29/41733H01L29/42384H01L29/78669H01L29/78678
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Quick Facts
Patent No.
US 9,590,021
App. No.
14/431,710
Granted
Mar 7, 2017
Kind
B2
Abstract

A thin-film transistor includes a gate, a first source, a second source, a first drain, a second drain, a first semiconductor layer, a second semiconductor layer, a first insulation layer, and a second insulation layer. The gate includes a first surface and a second surface that are opposite to each other. The first insulation layer is formed on the first surface and covers the first surface. The first semiconductor layer is formed on the first insulation layer. The first drain and the first source are formed on the first semiconductor layer in a spaced manner. The second insulation layer is formed on the second surface and covers the second surface. The second semiconductor layer is formed on the second insulation layer. The second drain and the second source re formed on the second semiconductor layer in a spaced manner. Also disclosed are an array substrate and a display device.

Claims (22)

1. An array substrate, comprising a substrate having a first surface and a first data line, a second data line, a gate line, a first electrode, a second electrode, and a thin-film transistor formed on the first surface of the substrate, wherein the gate line is connected to the gate, the first data line and the first electrode being respectively connected to the first source and the first drain, the second data line and the second electrode being respectively connected to the second source and the second drain; and wherein the thin-film transistor comprises a gate, a first source, a second source, a first drain, a second drain, a first semiconductor layer, a second semiconductor layer, a first insulation layer, and a second insulation layer, the gate comprising a first surface and a second surface that are opposite to each other, the first insulation layer being formed on the first surface and covering the first surface, the first semiconductor layer being formed on the first insulation layer, the first drain and the first source being formed on the first semiconductor layer in a spaced manner, the second insulation layer being formed on the second surface and covering the second surface, the second semiconductor layer being formed on the second insulation layer, the second drain and the second source being formed on the second semiconductor layer in a spaced manner;

wherein the first electrode is a block electrode, the second electrode being a strip electrode, the first electrode being spaced from the substrate by a distance that is smaller than a distance by which the second electrode is spaced from the substrate, the first electrode and the second electrode being located at different layers.

2. The array substrate as claimed in claim 1 , wherein the first source corresponds to the second source and the first drain corresponds to the second drain.

3. The array substrate as claimed in claim 1 , wherein the first and second insulation layers comprise materials of silicon nitride, silicon oxide, benzocyclobutene, polyester, or acrylic resin.

4. The array substrate as claimed in claim 1 , wherein the gate, the first and second sources and the first and second drains comprise materials of metal, alloy, conductive polymer, or conductive carbon nanotube.

5. An array substrate, comprising a substrate having a first surface and a first data line, a second data line, a gate line, a first electrode, a second electrode, and a thin-film transistor formed on the first surface of the substrate, wherein the gate line is connected to the gate, the first data line and the first electrode being respectively connected to the first source and the first drain, the second data line and the second electrode being respectively connected to the second source and the second drain; and wherein the thin-film transistor comprises a gate, a first source, a second source, a first drain, a second drain, a first semiconductor layer, a second semiconductor layer, a first insulation layer, and a second insulation layer, the gate comprising a first surface and a second surface that are opposite to each other, the first insulation layer being formed on the first surface and covering the first surface, the first semiconductor layer being formed on the first insulation layer, the first drain and the first source being formed on the first semiconductor layer in a spaced manner, the second insulation layer being formed on the second surface and covering the second surface, the second semiconductor layer being formed on the second insulation layer, the second drain and the second source being formed on the second semiconductor layer in a spaced manner;

wherein the array substrate comprises a primary pixel zone and a secondary pixel zone that are located on the same layer, the first electrode being located in the first pixel zone, the second electrode being located in the second pixel zone.

6. The array substrate as claimed in claim 5 , wherein the first electrode is a strip electrode and the second electrode is a block electrode.

7. The array substrate as claimed in claim 5 , wherein the first source corresponds to the second source and the first drain corresponds to the second drain.

8. The array substrate as claimed in claim 5 , wherein the first and second insulation layers comprise materials of silicon nitride, silicon oxide, benzocyclobutene, polyester, or acrylic resin.

9. The array substrate as claimed in claim 5 , wherein the gate, the first and second sources and the first and second drains comprise materials of metal, alloy, conductive polymer, or conductive carbon nanotube.

10. A display device, comprising an array substrate, the array substrate comprising a substrate having a first surface and a first data line, a second data line, a gate line, a first electrode, a second electrode, and a thin-film transistor formed on the first surface of the substrate, wherein the gate line is connected to the gate, the first data line and the first electrode being respectively connected to the first source and the first drain, the second data line and the second electrode being respectively connected to the second source and the second drain; and wherein the thin-film transistor comprises a gate, a first source, a second source, a first drain, a second drain, a first semiconductor layer, a second semiconductor layer, a first insulation layer, and a second insulation layer, the gate comprising a first surface and a second surface that are opposite to each other, the first insulation layer being formed on the first surface and covering the first surface, the first semiconductor layer being formed on the first insulation layer, the first drain and the first source being formed on the first semiconductor layer in a spaced manner, the second insulation layer being formed on the second surface and covering the second surface, the second semiconductor layer being formed on the second insulation layer, the second drain and the second source being formed on the second semiconductor layer in a spaced manner;

wherein the first electrode is a block electrode, the second electrode being a strip electrode, the first electrode being spaced from the substrate by a distance that is smaller than a distance by which the second electrode is spaced from the substrate, the first electrode and the second electrode being located at different layers.

11. The display device as claimed in claim 10 , wherein the first source corresponds to the second source and the first drain corresponds to the second drain.

12. The display device as claimed in claim 10 , wherein the first and second insulation layers comprise materials of silicon nitride, silicon oxide, benzocyclobutene, polyester, or acrylic resin.

13. The display device as claimed in claim 10 , wherein the gate, the first and second sources and the first and second drains comprise materials of metal, alloy, conductive polymer, or conductive carbon nanotube.

14. A display device, comprising an array substrate, the array substrate comprising a substrate having a first surface and a first data line, a second data line, a gate line, a first electrode, a second electrode, and a thin-film transistor formed on the first surface of the substrate, wherein the gate line is connected to the gate, the first data line and the first electrode being respectively connected to the first source and the first drain, the second data line and the second electrode being respectively connected to the second source and the second drain; and wherein the thin-film transistor comprises a gate, a first source, a second source, a first drain, a second drain, a first semiconductor layer, a second semiconductor layer, a first insulation layer, and a second insulation layer, the gate comprising a first surface and a second surface that are opposite to each other, the first insulation layer being formed on the first surface and covering the first surface, the first semiconductor layer being formed on the first insulation layer, the first drain and the first source being formed on the first semiconductor layer in a spaced manner, the second insulation layer being formed on the second surface and covering the second surface, the second semiconductor layer being formed on the second insulation layer, the second drain and the second source being formed on the second semiconductor layer in a spaced manner;

wherein the array substrate comprises a primary pixel zone and a secondary pixel zone that are located on the same layer, the first electrode being located in the first pixel zone, the second electrode being located in the second pixel zone.

15. The display device as claimed in claim 14 , wherein the first electrode is a strip electrode and the second electrode is a block electrode.

16. The display device as claimed in claim 14 , wherein the first source corresponds to the second source and the first drain corresponds to the second drain.

17. The display device as claimed in claim 14 , wherein the first and second insulation layers comprise materials of silicon nitride, silicon oxide, benzocyclobutene, polyester, or acrylic resin.

18. The display device as claimed in claim 14 , wherein the gate, the first and second sources and the first and second drains comprise materials of metal, alloy, conductive polymer, or conductive carbon nanotube.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 26, 2015
From: TANG, YUEJUN
To: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
Reel/Frame 035268/0496 →
Priority Claims (1)
CN 2014 1 0853562 · Dec 30, 2014 · national
Continuity (1)
Related Publication 20160343743A1 · Nov 24, 2016