Methods and apparatuses for manufacturing self-aligned integrated back contact heterojunction solar cells
View Patent ↗Methods and apparatuses for manufacturing self-aligned integrated back contact heterojunction solar cells are provided. In some embodiments, systems for forming a solar cell on a substrate are provided, the systems comprising: a master shadow mask positioned adjacent to the substrate on a first side of the master shadow mask; a first blocking mask placed adjacent to a second side of the master shadow mask; and a deposition machine that deposits material on the substrate through holes in the master shadow mask and the first blocking mask.
1. A system for forming a solar cell on a substrate, comprising:
a master shadow mask in contact with the substrate on a first side of the master shadow mask, wherein the master shadow mask has a plurality of holes that go from the first side to a second side of the master shadow mask, and wherein the master shadow mask is of uniform thickness;
a first blocking mask in contact with the second side of the master shadow mask, wherein the first blocking mask has a plurality of holes that go from a first side of the first blocking mask to a second side of the first blocking mask, wherein the first blocking mask is of uniform thickness, and wherein the first blocking mask covers at least one hole of the plurality of holes of the master shadow mask; and
a deposition machine that deposits material on the substrate through the plurality of holes in the master shadow mask and the plurality of holes in the first blocking mask.
2. The system of claim 1 , further comprising a second blocking mask in contact with the first blocking mask.
3. The system of claim 1 , wherein the material is (p+) a-Si.
4. The system of claim 1 , wherein the deposition machine is a plasma-enhanced chemical vapor deposition machine.
5. The system of claim 1 , further comprising pins that align the master shadow mask and the first blocking mask.
6. The system of claim 1 , further comprising a plurality of magnets that secure the first blocking mask relative to the substrate.
7. A method for forming a solar cell on a substrate, comprising:
positioning a master shadow mask in contact with the substrate on a first side of the master shadow mask, wherein the master shadow mask has a plurality of holes that go from the first side to a second side of the master shadow mask, and wherein the master shadow mask is of uniform thickness;
placing a first blocking mask in contact with the second side of the master shadow mask, wherein the first blocking mask has a plurality of holes that go from a first side of the first blocking mask to a second side of the first blocking mask, and wherein the first blocking mask is of uniform thickness, and wherein the first blocking mask covers at least one hole of the plurality of holes of the master shadow mask; and
depositing material on the substrate through the plurality of holes in the master shadow mask and the plurality of holes in the first blocking mask.
8. The method of claim 7 , further comprising positioning a second blocking mask in contact with the first blocking mask.
9. The method of claim 7 , wherein the material is (p+) a-Si.
10. The method of claim 7 , wherein the depositing of material is performed using a plasma-enhanced chemical vapor deposition machine.
11. The method of claim 7 , further comprising aligning the master shadow mask and the first blocking mask using pins.
12. The method of claim 7 , further comprising securing the first blocking mask relative to the substrate using a plurality of magnets.