Semiconductor device with silicide
A semiconductor device includes a first type region including a first conductivity type. The semiconductor device includes a second type region including a second conductivity type. The semiconductor device includes a channel region extending between the first type region and the second type region. The semiconductor device includes a first silicide region on a first type surface region of the first type region. The first silicide region is separated at least one of a first distance from a first type diffusion region of the first type region or a second distance from the channel region.
1. A semiconductor device comprising:
a first type region;
a second type region;
a channel region extending between the first type region and the second type region;
a first silicide region above and in contact with a first type surface region of the first type region, the first silicide region separated at least one of a first distance from a first type diffusion region of the first type region or a second distance from the channel region;
a dielectric region between the first silicide region and the first type diffusion region and in contact with a sidewall of the first silicide region, the dielectric region overlying the first silicide region; and
a gate dielectric in contact with the channel region and in contact with the dielectric region, wherein the gate dielectric overlies the first silicide region and the dielectric region is disposed between the first silicide region and the gate dielectric.
2. The semiconductor device of claim 1 , wherein the first distance is greater than 0 nm.
3. The semiconductor device of claim 1 , wherein the second distance is greater than 0 nm.
4. The semiconductor device of claim 1 , wherein the dielectric region is in contact with a sidewall of the first type diffusion region.
5. The semiconductor device of claim 1 , wherein the first type region and the second type region have a same conductivity type.
6. The semiconductor device of claim 1 , wherein a first type region height of the first type diffusion region is less than a first silicide region height of the first silicide region.
7. The semiconductor device of claim 1 , wherein a first type region height of the first type diffusion region is greater than a first silicide region height of the first silicide region.
8. A semiconductor device comprising:
a first type region;
a second type region;
a channel region extending between the first type region and the second type region;
a first silicide region above and in contact with a first type surface region of the first type region, a first silicide region edge of the first silicide region separated at least one of a first distance from a first type region edge of a first type diffusion region of the first type region or a second distance from a channel region edge of the channel region;
a dielectric region between the first silicide region and the first type diffusion region, wherein the dielectric region, the first silicide region, and the first type diffusion region are laterally co-planar; and
a gate dielectric in contact with the channel region and in contact with the dielectric region, wherein the gate dielectric overlies the first silicide region and the dielectric region is disposed between the first silicide region and the gate dielectric.
9. The semiconductor device of claim 8 , wherein a first type region height of the first type diffusion region is less than a first silicide region height of the first silicide region.
10. The semiconductor device of claim 8 , wherein the dielectric region is in contact with the first type surface region.
11. The semiconductor device of claim 8 , comprising a gate electrode overlying the gate dielectric and the first silicide region.
12. The semiconductor device of claim 8 , wherein a first type region height of the first type diffusion region is greater than a first silicide region height of the first silicide region.
13. The semiconductor device of claim 8 , wherein a second silicide region covers the second type region.
14. The semiconductor device of claim 8 , wherein the first type region comprises a source region and the second type region comprises a drain region.
15. The semiconductor device of claim 8 , wherein the first type region comprises a drain region and the second type region comprises a source region.
16. The semiconductor device of claim 8 , wherein the first type region and the second type region have a same conductivity type.
17. A semiconductor device comprising:
a first type region comprising:
a first type surface region; and
a first type diffusion region;
a second type region;
a channel region extending between the first type region and the second type region;
a first silicide region above and in contact with the first type surface region;
a dielectric region above and in contact with the first type surface region and overlying the first silicide region, the dielectric region disposed between and in contact with the first silicide region and the first type diffusion region; and
a gate dielectric in contact with the channel region and in contact with the dielectric region, wherein the gate dielectric overlies the first silicide region and the dielectric region is disposed between the first silicide region and the gate dielectric.
18. The semiconductor device of claim 17 , wherein the dielectric region is disposed around a circumference of the first type diffusion region.
19. The semiconductor device of claim 17 , wherein the first type region and the second type region have a same conductivity type.
20. The semiconductor device of claim 17 , comprising a gate electrode overlying the gate dielectric, the dielectric region, and the first silicide region.