Transmission electron microscopy supports and methods of making
View Patent ↗A method of making a Transmission Electron Microscopy support comprising depositing a sacrificial layer to the top side of a lacey or holey carbon structure or support or wire mesh, depositing an Atomic Layer Deposition layer to the bottom side of the sacrificial layer, removing the sacrificial layer, forming a Transmission Electron Microscopy support. The Transmission Electron Microscopy support comprises an Atomic Layer Deposition layer which is carbon-less, thin, flexible, can be thermally cleaned, can be plasma cleaned, and contains chemical functionalities to immobilize particles.
1. A method of making a Transmission Electron Microscopy support, comprising:
depositing a sacrificial layer to the top side of a lacey or holey carbon structure or support grid;
depositing an Atomic Layer Deposition layer to the bottom side of the sacrificial layer; and
removing the sacrificial layer to form a Transmission Electron Microscopy support.
2. The method of making a Transmission Electron Microscopy support of claim 1 , further comprising the step of:
cleaning the Transmission Electron Microscopy support.
3. The method of making a Transmission Electron Microscopy support of claim 1 wherein the sacrificial layer is one selected from the group consisting of amorphous carbon, formvar, polymer, and silicon monoxide and wherein the Atomic Layer Deposition layer contains functionalities to immobilize nanoparticles.
4. The method of making a Transmission Electron Microscopy support of claim 3 wherein the step of removing the sacrificial layer is performed using a gaseous plasma method of a chemical solvents method.
5. The method of making a Transmission Electron Microscopy support of claim 4 wherein the gaseous plasma is one selected from the group consisting of oxygen, argon, and xenon difluoride.
6. The method of making a Transmission Electron Microscopy support of claim 5 wherein the chemical solvent is one selected from the group consisting of aqueous ammonium fluoride, chloroform, ethylene dichloride, and acetone.
7. The method of making a Transmission Electron Microscopy support of claim 6 wherein the Atomic Layer Deposition layer comprises alumina and wherein the thickness of the Atomic Layer Deposition layer is about 1 nm to about 2 nm.
8. A method of making a Transmission Electron Microscopy support, comprising:
applying a sample to a Transmission Electron Microscopy support formed by the steps of depositing a sacrificial layer to the top side of a lacey or holey carbon structure or support grid, depositing an Atomic Layer Deposition layer to the bottom side of the sacrificial layer, and removing the sacrificial layer.
9. The method of making a Transmission Electron Microscopy support of claim 8 , further comprising the step of:
cleaning the sample after application to the Transmission Electron Microscopy support.
10. A Transmission Electron Microscopy support, comprising:
an Atomic Layer Deposition layer supported by a lacey or holey carbon structure or support;
wherein the Atomic Layer Deposition layer on the lacey or holey carbon structure was formed by depositing a sacrificial layer to the top side of a lacey or holey carbon structure or support, then depositing an Atomic Layer Deposition layer to the bottom side of the lacey or holey carbon structure, then removing the sacrificial layer and thereby forming a Transmission Electron Microscopy support.
11. The Transmission Electron Microscopy support of claim 10 , wherein the Transmission Electron Microscopy support is flexible and contains functionalities to immobilize nanoparticles.
12. A Transmission Electron Microscopy support, comprising:
an Atomic Layer Deposition layer which is carbon-less, thin, flexible, can be thermally cleaned, can be plasma cleaned, and contains chemical functionalities to immobilize particles.