Ion optical elements
Ion optics devices and related methods of making and using the same are disclosed herein that generally involve forming a plurality of electrode structures on a single substrate. An aspect ratio of the structures relative to a plurality of recesses which separate the structures can be selected so as to substantially prevent ions passing through the finished device from contacting exposed, electrically-insulating portions of the substrate. The substrate material can be a material that is relatively inexpensive and easy to machine into complex shapes with high precision (e.g., a printed circuit board material). In some embodiments, discrete ion optical elements are disclosed which can be formed from a core material to which an electrically-conductive coating is applied, the core material being relatively inexpensive and easy to machine with high precision. The coating can be configured to substantially prevent outgassing from the core under the vacuum conditions typically experienced in a mass spectrometer.
1. An ion optical element, comprising:
a substrate comprising:
first and second opposed surfaces;
a plurality of protrusions extending from said first surface, each protrusion having a top surface, at least one sidewall, and an electrically-conductive coating disposed on said top surface and at least a portion of said at least one sidewall; and
at least one recess separating said protrusions, each recess having a portion of said first surface as a floor thereof;
wherein a depth of each recess is at least about one half of a width of said recess.
2. The ion optical element of claim 1 , wherein said top surface of at least some of said protrusions is planar or curved or perpendicular to said at least one sidewall.
3. The ion optical element of claim 1 , wherein said at least one sidewall of at least some of said protrusions is curved.
4. The ion optical element of claim 1 , wherein at least some of said protrusions include an electrically-conductive via extending through the substrate from the electrically-conductive coating of the protrusion to an electrically-conductive pad formed on said second surface.
5. The ion optical element of claim 4 , wherein the electrically-conductive via extends from a portion of the electrically-conductive coating disposed on either, the top surface of the protrusion or on the at least one sidewall of the protrusion, to said pad.
6. The ion optical element of claim 4 , wherein said pad is coupled to at least one of a resistor, a resistive film, and a power supply configured to apply an electric potential thereto.
7. The ion optical element of claim 1 , further comprising a vent extending through the substrate from the floor of said at least one recess to the second surface that permits gas flow therethrough.
8. The ion optical element of claim 1 , wherein the substrate comprises any of an electrically-insulating material and a semi-conducting material.
9. The ion optical element of claim 1 , wherein the substrate comprises any of ceramics, organic polymers, glass, machinable ceramics, and materials used in 3D printing.
10. The ion optical element of claim 1 , wherein the substrate comprises a printed circuit board material.
11. The ion optical element of claim 10 wherein the printed circuit board material is selected from the group consisting of laminated polyamides, G-10, Teflon-based materials, phenolic cotton FR-2, and woven glass FR-4.
12. The ion optical element of claim 1 , wherein the electrically-conductive coating comprises a non-oxidizing metal.
13. The ion optical element of claim 12 wherein the non-oxidizing metal comprises at least one of gold, nickel, platinum, palladium, titanium, and molybdenum.
14. The ion optical element of claim 1 , wherein the ion optical element comprises at least one of a time-of-flight reflectron, a time-of-flight accelerator, an ion funnel, an ion tunnel, and an ion mobility column.
15. A method of manufacturing an ion optical element, comprising:
selectively removing portions of a printed circuit board substrate to generate a plurality of protrusions, said protrusions being separated from one another by a plurality of recesses each having a depth that is at least about one half of its width, each of said protrusions having a top surface and at least one sidewall;
depositing an electrically-conductive coating on said top surface and at least a portion of said at least one sidewall of each of said protrusions; and
forming a non-coated region between each of said protrusions such that the protrusions define a plurality of discrete electrodes.
16. The method of claim 15 , wherein said electrically-conductive coating is deposited using at least one of electroplating and vapor deposition.
17. The method of claim 15 , wherein each of said non-coated regions is formed by applying a mask to said non-coated region before depositing the electrically-conductive coating and removing the mask after depositing the electrically-conductive coating.
18. The method of claim 15 , wherein each of said non-coated regions is formed by depositing the electrically-conductive coating over floor surfaces of said recesses, and then selectively removing said coating from said floor surfaces.
19. The method of claim 15 , wherein each of said non-coated regions is formed by etching portions of the electrically-conductive coating.