High-frequency optoelectronic detector, system and method
An optoelectronic device for detecting electromagnetic radiation includes a body of semiconductor material. A first region and a second region that form a junction are provided within the body. A recess extends into the body and is delimited by side arranged transverse to a main surface of the body. The junction is exposed by the sidewall to coupled electromagnetic radiation received in the recess into a photodiode formed by the junction.
1. An optoelectronic device, comprising:
a body of semiconductor material including a first well region of a first conductivity type and a second well region of a second conductivity type opposite the first conductivity type, wherein the second well region is surrounded laterally and on a bottom thereof by the first well region, and wherein the first well region is surrounded laterally and on a bottom thereof by the body, the first and second well regions forming a photodiode;
a recess passing completely through the second well region and said recess further passing only partially through the first well region;
wherein said recess is laterally surrounded on all sides by the first and second well regions and is defined by a sidewall forming an angle with the main surface that is greater than ninety degrees; and
wherein said recess is configured to receive electromagnetic radiation, said sidewall intersecting a depletion region of the photodiode at an interface between the first and second well regions such that the received electromagnetic radiation is coupled from the recess to said photodiode at the intersected depletion region.
2. The optoelectronic device of claim 1 , wherein said recess further comprises a bottom wall delimited by said sidewall at the first well region, said bottom wall extending parallel to an upper surface of the body.
3. The optoelectronic device of claim 1 , further comprising an intrinsic region extending between the first and second well regions, said recess further passing completely through said intrinsic region, said interface comprising a first interface between the intrinsic region and the first well region and a second interface between the intrinsic region and the second well region.
4. The optoelectronic device of claim 1 , further comprising a layer at least partially filling said recess and configured to guide propagation of said electromagnetic radiation in said recess to the intersected depletion region.
5. The optoelectronic device of claim 4 , wherein said layer further extends along a top surface of said body.
6. The optoelectronic device of claim 4 , wherein said layer has an index of refraction that is greater than an index of refraction of the body.
7. The optoelectronic device of claim 1 , wherein said recess in plan view has a rectangular shape having a peripheral outline delimited by said sidewall.
8. The optoelectronic device of claim 1 , wherein said recess in plan view has a cross shape having a peripheral outline delimited by said sidewall.
9. The optoelectronic device of claim 1 , wherein the first and second well regions of the photodiode do not form a mesa structure.
10. An optoelectronic device, comprising:
a body of semiconductor material including a first well region of a first conductivity type and a second well region of a second conductivity type opposite the first conductivity type, wherein the second well region is surrounded laterally and on a bottom thereof by the first well region, and wherein the first well region is surrounded laterally and on a bottom thereof by the body, the first and second well regions forming a photodiode;
a recess passing completely through the second well region and said recess further passing only partially through the first well region;
wherein said recess is laterally surrounded on all sides by the first and second well regions and is defined by a sidewall that intersecting a depletion region of the photodiode at an interface between the first and second well regions; and
wherein said recess is configured to receive electromagnetic radiation that is coupled to said photodiode at the intersected depletion region.
11. The optoelectronic device of claim 10 , further comprising an intrinsic region extending between the first and second well regions, said recess further passing completely through said intrinsic region, said interface comprising a first interface between the intrinsic region and the first well region and a second interface between the intrinsic region and the second well region.
12. The optoelectronic device of claim 10 , further comprising a layer at least partially filling said recess and configured to guide propagation of said electromagnetic radiation in said recess to the intersected depletion region.
13. The optoelectronic device of claim 12 , wherein said layer further extends along a top surface of said body.
14. The optoelectronic device of claim 12 , wherein said layer has an index of refraction that is greater than an index of refraction of the body.
15. The optoelectronic device of claim 10 , wherein said recess in plan view has a rectangular shape having a peripheral outline delimited by said sidewall.
16. The optoelectronic device of claim 10 , wherein said recess in plan view has a cross shape having a peripheral outline delimited by said sidewall.
17. The optoelectronic device of claim 10 , wherein the first and second well regions of the photodiode do not form a mesa structure.