Radiation detector and scintillator panel, and methods for manufacturing same

1. A radiation detector, comprising:

a photoelectric conversion substrate converting light into an electrical signal; and

a scintillator layer contacting the photoelectric conversion substrate and converting radiation incident from the outside into light,

the scintillator layer being a fluorescer of CsI containing Tl as an activator, the CsI being a halide, a concentration of the activator inside the fluorescer being 1.6 mass %±0.4 mass %, the concentration of the activator inside the fluorescer in an in-plane direction of the scintillator layer having the relationship of central portion>peripheral portion, where central portion is a central region of a formation region of the scintillator layer, and peripheral portion is an outer circumferential region of the formation region of the scintillator layer.

2. The detector according to claim 1 , wherein the central portion of the scintillator layer occupies 50% or more of the formation region of the scintillator layer.

3. The detector according to claim 1 , wherein in the scintillator layer inside each region of the central portion and the peripheral portion of the scintillator layer, a concentration distribution of the activator is ±15% or less inside the fluorescer in a film thickness direction and the in-plane direction of the scintillator layer, and the concentration distribution of the activator is ±15% or less inside the fluorescer in the film thickness direction and the in-plane direction of the scintillator layer in a region having a unit film thickness of 200 nm or less.

4. The detector according to claim 1 , wherein the scintillator layer has a columnar crystal structure.

5. A method for manufacturing a radiation detector,

the radiation detector including a photoelectric conversion substrate and a scintillator layer, the photoelectric conversion substrate converting light into an electrical signal,

the scintillator layer contacting the photoelectric conversion substrate and converting radiation incident from the outside into light,

the scintillator layer being a fluorescer of CsI containing Tl as an activator, the CsI being a halide, the method comprising:

forming the scintillator layer by vapor deposition using CsI and Tl as a material source to cause a concentration of the activator inside the fluorescer to be 1.6 mass %±0.4 mass % and cause the concentration of the activator inside the fluorescer in an in-plane direction of the scintillator layer to have the relationship of central portion >peripheral portion, where central portion is a central region of a formation region of the scintillator layer, and peripheral portion is an outer circumferential region of the formation region of the scintillator layer.

6. A scintillator panel, comprising:

a support substrate transmitting radiation; and

a scintillator layer contacting the support substrate and converting radiation incident from the outside into light, the scintillator layer being a fluorescer of CsI containing Tl as an activator, the CsI being a halide, a concentration of the activator inside the fluorescer being 1.6 mass %±0.4 mass %, the concentration of the activator inside the fluorescer in an in-plane direction of the scintillator layer having the relationship of central portion >peripheral portion, where central portion is a central region of a formation region of the scintillator layer, and peripheral portion is an outer circumferential region of the formation region of the scintillator layer.

7. The scintillator panel according to claim 6 , wherein the central portion of the scintillator layer occupies 50% or more of the formation region of the scintillator layer.

8. The scintillator panel according to claim 6 , wherein

in the scintillator layer inside each region of the central portion and the peripheral portion of the scintillator layer, a concentration distribution of the activator is ±15% or less inside the fluorescer in a film thickness direction and the in-plane direction of the scintillator layer, and the concentration distribution of the activator is ±15% or less inside the fluorescer in the film thickness direction and the in-plane direction of the scintillator layer in a region having a unit film thickness of 200 nm or less.

9. The scintillator panel according to claim 6 , wherein the scintillator layer has a columnar crystal structure.

10. The scintillator panel according to claim 6 , wherein the support substrate includes a substance having an element lighter than a transition metal element as a major component.

11. A method for manufacturing a scintillator panel,

the scintillator panel including a support substrate and a scintillator layer, the support substrate transmitting radiation, the scintillator layer contacting the support substrate and converting radiation incident from the outside into light,

the scintillator layer being a fluorescer of CsI containing Tl as an activator, the CsI being a halide,

the method comprising:

forming a scintillator layer by vapor deposition using CsI and Tl as a material source to cause a concentration of the activator inside the fluorescer to be 1.6 mass %±0.4 mass % and cause the concentration of the activator inside the fluorescer in an in-plane direction of the scintillator layer to have the relationship of central portion>peripheral portion, where central portion is a central region of a formation region of the scintillator layer, and peripheral portion is an outer circumferential region of the formation region of the scintillator layer.