IP Library Granted Patent US 9,741,691
Granted Patent B2
US 9,741,691 · App. 14/698,842 · Granted Aug 22, 2017

Power delivery network (PDN) design for monolithic three-dimensional (3-D) integrated circuit (IC)

Inventors: Sung Kyu Lim (Duluth, GA); Kambiz Samadi (San Diego, CA); Yang Du (Carlsbad, CA)
Assignee: QUALCOMM Incorporated
H01L25/0657H01L23/481H01L23/5286H01L24/05H01L24/11H01L24/14H01L25/50H01L27/0688H01L2224/05147H01L2224/131H01L2224/32145H01L2224/73153H01L2225/06541H01L2924/10253
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Quick Facts
Patent No.
US 9,741,691
App. No.
14/698,842
Granted
Aug 22, 2017
Kind
B2
Abstract

Systems and methods relate to power delivery networks (PDNs) for monolithic three-dimensional integrated circuits (3D-ICs). A monolithic 3D-IC includes a first die adjacent to and in contact with power/ground bumps. A second die is stacked on the first die, the second die separated from the power/ground bumps by the first die. One or more bypass power/ground vias and one or more monolithic inter-tier vias (MIVs) are configured to deliver power from the power/ground bumps to the second die.

Claims (10)

1. An apparatus for delivering power in a monolithic three-dimensional integrated circuit (3D-IC), comprising:

a first die, with a first side of the first die adjacent to and in contact with power/ground bumps, and a second side of the first die comprising a dielectric layer;

a second die stacked on the first die, with a third side of the second die in contact with the dielectric layer, and the second die separated from the power/ground bumps by the first die;

at least a first bypass power/ground via formed in the first die, the first bypass power/ground via in contact with the power/ground bumps; and

a vertical monolithic inter-tier via (MIV) configured to traverse the dielectric layer and couple the first bypass power/ground via to a power delivery network (PDN) in the second die, a combination of at least the first bypass power/ground via, the MIV, and the PDN in the second die to deliver power from the power/ground bumps to the second die.

2. The apparatus of claim 1 , wherein the first side of the first die is a back side of the first die, the second side of the first die is a face of the first die comprising a metal side of the first die, the third side of the second die is a face of the second die comprising a metal side of the second die, wherein second die is stacked on the first die in a face-to-face configuration.

3. The apparatus of claim 2 , wherein the first die comprises a global power delivery network (PDN) layer formed on the face of the first die.

4. The apparatus of claim 1 , wherein the combination further comprises at least a second bypass power/ground via to couple the MIV to the PDN in the second die.

5. The apparatus of claim 1 , wherein the first side of the first die is a face of the first die comprising a metal side of the first die, the second side of the first die is a back side of the first die, the third side of the second die is a face of the second die comprising a metal side of the second die, wherein the second die is stacked on the first die in a face-to-back configuration.

6. The apparatus of claim 5 , wherein the first die comprises a global power delivery network (PDN) layer formed on the back side of the first die.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 25, 2015
From: LIM, SUNG KYU; SAMADI, KAMBIZ; DU, YANG
To: QUALCOMM INCORPORATED
Reel/Frame 035705/0527 →
Continuity (1)
Related Publication 20160322331A1 · Nov 3, 2016