IP Library Granted Patent US 9,750,121
Granted Patent B2
US 9,750,121 · App. 15/022,413 · Granted Aug 29, 2017

Power supply apparatus

Inventors: Yoichiro Tabata (Tokyo, JP); Yujiro Okihara (Tokyo, JP); Noriyuki Nakamura (Tokyo, JP); Shinichi Nishimura (Tokyo, JP)
Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
H05H1/46C01B13/11H02M7/48H02M2007/4815H05H2001/4682Y02B70/1441Y02P20/121
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,750,121
App. No.
15/022,413
Granted
Aug 29, 2017
Kind
B2
Abstract

A power supply apparatus outputs an alternating-current voltage to a plasma generator being a capacitive load and the power supply apparatus has a configuration that a transformer included in the power supply apparatus has a secondary-side magnetizing inductance more than five times as great as a leakage inductance.

Claims (17)

1. A power supply apparatus that outputs an alternating-current voltage to a plasma generator being a capacitive load including a plurality of discharge cells connected to one another, said power supply apparatus comprising:

an inverter that converts direct-current electric power to alternating-current electric power; and

a transformer located between said inverter and said plasma generator, wherein

a transformer inductance value obtained by combining a magnetizing inductance and a leakage inductance is set such that said transformer inductance value corresponds to a capacitance value which is a load of said plasma generator,

said power supply apparatus is operated at a working frequency within a resonance frequency range which is obtained by a resonance frequency expression defined by combining said transformer inductance value and said capacitance value, and

said transformer is set such that said magnetizing inductance is more than five times as great as said leakage inductance, and said transformer is set such that a calculated inductance value calculated by applying said capacitance value and said working frequency into said resonance frequency expression is given as said transformer inductance value.

2. The power supply apparatus according to claim 1 ,

wherein a core gap length of said transformer is equal to or greater than 1 mm and equal to or smaller than 3.5 mm.

3. The power supply apparatus according to claim 1 , further comprising a current-limiting reactor that is located on an output side of said inverter and regulates a short-circuit current, wherein

said resonance frequency expression is defined by combining an inductance value of said current-limiting reactor, said transformer inductance value and said capacitance value.

4. The power supply apparatus according to claim 1 ,

wherein inductance components of said transformer include an inductance component of a current-limiting reactor that regulates a short-circuit current.

5. The power supply apparatus according to claim 1 ,

wherein said inverter outputs a resonance frequency given by ½·π·[(combined inductance component of said power supply apparatus downstream from an output side of said inverter)·(a total capacitance of said plasma generator)] 0.5 .

6. The power supply apparatus according to claim 1 , wherein

said transformer comprises a plurality of said transformers, and

said plurality of transformers are connected in parallel.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2016
From: TABATA, YOICHIRO; OKIHARA, YUJIRO; NAKAMURA, NORIYUKI; NISHIMURA, SHINICHI
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
Reel/Frame 038002/0889 →
Continuity (1)
Related Publication 20160234925A1 · Aug 11, 2016