IP Library Granted Patent US 9,768,160
Granted Patent B2
US 9,768,160 · App. 14/454,299 · Granted Sep 19, 2017

Semiconductor device, electronic circuit and method for switching high voltages

Inventors: Joachim Weyers (Hoehenkirchen, DE); Franz Hirler (Isen, DE); Anton Mauder (Kolbermoor, DE)
Assignee: Infineon Technologies Austria AG
H01L27/0629H01L29/407H01L29/41725H01L29/7397H01L29/7802H01L29/7803H01L29/7804H01L29/7808H01L29/7809H01L29/7811H01L29/7813H01L29/0623H01L29/866H01L29/8611Y10T307/76
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Quick Facts
Patent No.
US 9,768,160
App. No.
14/454,299
Granted
Sep 19, 2017
Kind
B2
Abstract

Disclosed is a semiconductor device, an electronic circuit, and a method. The semiconductor device includes a semiconductor body; at least one transistor cell including a source region, a drift region, a body region separating the source region from the drift region, and a drain region in the semiconductor body, and a gate electrode dielectrically insulated from the body region by a gate dielectric; a source node connected to the source region and the body region; a contact node spaced apart from the body region and the drain region and electrically connected to the drain region; and a rectifier element formed between the contact node and the source node.

Claims (36)

1. A semiconductor device, comprising:

a semiconductor body;

at least one transistor cell comprising a source region, a drift region, a body region separating the source region from the drift region, and a drain region in the semiconductor body, and a gate electrode dielectrically insulated from the body region by a gate dielectric;

a source node connected to the source region and the body region;

a contact node laterally spaced apart from the body region and vertically spaced apart from the drain region and electrically connected to the drain region; and

a rectifier element comprising a first doped region of a doping type complementary to the doping type of the drift region that is formed in a portion of the semiconductor body that is laterally spaced apart from the source and body regions.

2. The semiconductor device of claim 1 ,

wherein the source region and the drain region are distant in a vertical direction of the semiconductor body, and

wherein the contact node is formed on the first doped region.

3. The semiconductor device of claim 2 ,

wherein the contact node is connected to the drain region via an edge surface of the semiconductor body.

4. The semiconductor device of claim 1 ,

wherein the contact node is connected to the drain region via a resistor.

5. The semiconductor device of claim 4 ,

wherein the resistor is formed on a surface of the semiconductor body.

6. The semiconductor device of claim 1 , wherein the contact node is spaced apart from an edge surface of the semiconductor body.

7. The semiconductor device of claim 1 , wherein the rectifier device comprises:

a second doped semiconductor region of the same doping type as the drift region and more highly doped than the drift region,

wherein the first doped semiconductor region and the second doped semiconductor region from a pn junction.

8. The semiconductor device of claim 1 , further comprising a plurality of transistor cells connected in parallel.

9. An electronic circuit, comprising:

a first semiconductor device comprising a load path between a source node and a drain node, a control node, and an internal rectifier element formed between a contact node and a source node, wherein the contact node is spaced apart from the body region and the drain region in a semiconductor body of the first semiconductor device; and

a second semiconductor device comprising a load path between a drain node and a source node and a control node,

wherein the first semiconductor device and the second semiconductor device have their load paths connected in series, and

wherein the control node of the second semiconductor device is coupled to the source node of the first semiconductor device,

wherein the second semiconductor device further comprises an internal rectifier element comprising a first doped region that is formed in a portion of a semiconductor body of the second semiconductor device that is laterally spaced apart from source and body regions of the second semiconductor device.

10. The electronic circuit of claim 9 ,

wherein the electronic circuit further comprises a third semiconductor device comprising a load path between a drain node and a source node and a control node,

wherein the second semiconductor device and the third semiconductor device have their load paths connected in series and wherein the control node of the third semiconductor device is coupled to the source node of the second semiconductor device.

11. A semiconductor device, comprising:

a semiconductor body;

at least one transistor cell comprising a source region, a drift region, a body region separating the source region from the drift region, and a drain region in the semiconductor body, and a gate electrode dielectrically insulated from the body region by a gate dielectric;

a source node connected to the source region and the body region;

a drain electrode electrically connected to the drain region;

a contact node spaced apart from the body region and the drain electrode and electrically connected to the drain region; and

a rectifier element formed between the contact node and the source node.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 7, 2014
From: HIRLER, FRANZ; MAUDER, ANTON; WEYERS, JOACHIM
To: INFINEON TECHNOLOGIES AUSTRIA AG
Reel/Frame 033489/0465 →
Continuity (2)
Continuation In Part 13963383 · Aug 9, 2013
Related Publication 20150042177A1 · Feb 12, 2015